Asml Netherlands B.v.

Asml Holding N.v.

Roel De Jonge

Johannes Catharinus Hubertus Mulkens

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Marcel Mathijs Theodore Marie Dierichs

Matthew Lipson

Ronald A Wilklow

Damian Fiolka

Christian Wagner

Wilhelmus Petrus De Boeij

Tilmann Heil

Paul Van Der Veen

Roland Pieter Stolk

A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.

Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid

A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.

Lithographic apparatus and device manufacturing method

A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

Polarized radiation in lithographic apparatus and device manufacturing method

A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light. The projection system is configured to project the modified polarization-retarded polarized light.

System and method for providing modified illumination intensity

A system and method utilize a birefringence inducer to induce or change birefringence of an optical element to change an index of refraction within the optical element to produce a polarization-retarded light beam that passes through the optical element. The optical element can include one or more optical plates or adjustable optical compensators. The birefringence inducer can apply external forces on the optical element, such as mechanical, electrical, magnetic, or acoustical forces. A linear polarizer polarizes the output beam from the optical element to produce a linear polarized modified intensity light beam with a desired intensity distribution. A control system for controlling the inducing of birefringence can include an intensity detector and controller, and can provide a control signal to the birefringence inducer.

A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.

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Veldhoven, Netherlands

Roel De Jonge