The Procter Gamble Company

Warner Chilcott Company, LLC

Akebia Therapeutics, Inc.

Rodney D Bush

Donald Lynn Bissett

Ranjit U Chatterjee

Namal Chithranga Warshakoon

Stephen Wayne Heinzman

James J Benedict

Richard J Sunberg

Medford D Robbins

Namal Chithranga Warshokoon

Larry Neil Mackey

Daniel Stedman Connor

Neil Gregory Almstead

Biswanath De

Michael G Natchus

Stanislaw Pikul

Yetunde Olabisi Taiwo

Roger Gunnard Bookland

Rimma Sandler Bradley

Compounds of Formula (I) are effective in the treatment of a microbial infection.

N-benzyl-4-methyleneamino-3-hydroxy-2-pyridones

Compounds of Formula (I): are effective in the treatment of a microbial infection.

N-alkyl-4-methyleneamino-3-hydroxy-2-pyridones

N-sulfonyl-4-methyleneamino-3-hydroxy-2-pyridones

Compounds of Formula (I)are effective in the treatment of a microbial infection.

The invention provides compounds of formula

Acyclic metalloprotease inhibitors

Disclosed are pharmaceutical compositions comprising a radical scavenging agent and an anti-inflammatory agent which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of a radical scavenging agent, an anti-inflammatory agent, and a sunscreen are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Compositions comprising a radical scavenging compound and an

The subject invention relates to pharmaceutical compositions comprising a safe and effective amount of a compound having the structure: ##STR1## wherein n is 3 or 4; each R is independently alkyl or alkoxy; and R' is C.sub.1 C.sub.20 alkyl; and a pharmaceutically-acceptable topical carrier. The subject invention also relates to methods for preventing damage to skin, without markedly sensitizing the skin, by topically applying a safe and effective amount of such compounds to the skin.

Benzoylacetate esters as non-sensitizing chelating photo-protectants

The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents. Also involved are compositions comprising chelating agents together with anti-inflammatory agents, sunscreening agents, and/or radical scavenging agents. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are also involved.

Photoprotection compositions comprising chelating agents

The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents having the structure: ##STR1## wherein each --R.sup.1 is independently selected from the group consisting of alkyl, aryl, heteroaryl and heterocycle, or the --R.sup.1 's are covalently bonded together to form a cyclic alkyl or heterocyclic ring; --R.sup.2 and --R.sup.3 are --OR.sup.4, in which case there is no bond or a polar bond between --R.sup.2 and the nitrogen covalently bonded to --R.sup.3, each --R.sup.4 being independently selected from the group consisting of hydrogen, alkyl and aryl, except that both --R.sup.4 's are not methyl when both --R.sup.1 's are furyl; or --R.sup.2 is --O-- and is covalently bonded to the nitrogen which is covalently bonded to --R.sup.3, and --R.sup.3 is --O-- (there being a + charge on the nitrogen to which it is bonded) or nil; wherein the .alpha.-diamine compounds consist essentially of compounds wherein .dbd.NR.sup.2 and .dbd.NR.sup.3 are in amphi configuration when both --R.sup.2 and --R.sup.3 are --OH, and when both --R.sup.1 's are furyl or the --R.sup.1 's are covalently bonded together to form a cyclohexanedione structure. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are also involved.

Chelator compositions comprising .alpha.-diamine compounds

The subject invention relates to methods and compositions comprising: a) from about 0.1% to about 5% of a compound having the structure selected from the group consisting of: ##STR1## wherein each R is independently selected from the group consisting of hydrogen, alkyl, and aryl; each R' is independently selected from the group consisting of hydrogen, alkoxy, and alkyl; Z and Z' are independently selected from the group consisting of NH, O, and CH.sub.2 such that when Z or Z' is NH, the other is not O; or a pharmaceutically acceptable salt of any of the aforementioned compounds; and b) a pharmaceutically-acceptable topical carrier.

Photoprotection compositions comprising certain chelating agents

The present invention provides deodorant compositions for controlling malodor from perspiration comprising a safe an effective amount of a 1,3-diketone compound having the general formula: ##STR1## wherein each W is independently selected from the group consisting of O, S and (CH.sub.2).sub.n, wherein n=1-3; and each X is independently selected from the group consisting of hydrogen, halogen, substituted or unsubstituted alkyl having from about 1 to about 5 carbon atoms, or two X moieties are covalently bonded to form a substituted or unsubstituted alkyl, heteroalkyl, aryl or heteroaryl ring having from about 3 to about 12 atoms including from 0 to about 3 heteroatoms in the ring; and a topical carrier; whereby the composition is suitable for topical application to the skin or to articles of clothing worn in the vicinity of the skin. Methods for controlling malodor comprising depositing on skin in the axilla or crotch region, or to articles of clothing worn in the vicinity of the skin of a safe and effective amount of a 1,3-diketone of the present invention, are also provided.

Diketone deodorant composition and method of deodorization

The subject invention relates to pharmaceutical compositions comprising a safe and effective amount of a compound having the structure: ##STR1## wherein each R is alkyl or hydrogen, at least two being alkyl; R' is hydrogen, alkyl or aryl; R' is alkyl or halo; and each X is independently oxygen or sulfur; and a pharmaceutically-acceptable carrier. The subject invention also relates to methods for preventing damage to skin by topically applying a safe and effective amount of such compounds to the skin.

Substituted phenyl-1,3-diketones as protectants against skin damage

Disclosed are photoprotective compositions comprising a radical scavenging agent and an anti-inflammatory agent which are useful for topical application to prevent damage to skin caused by acute or chronic UV exposure. Combinations of a radical scavenging agent, an anti-inflammatory agent, and a sunscreen are also disclosed. Also disclosed is a method for using these compositions topically to prevent damage to skin caused by acute or chronic UV exposure.

Growing community of inventors

Fairfield, OH, United States of America

Rodney D Bush