Advanced Technology Materials, Inc.

Other

Robin L Binder

Peter S Kirlin

Gregory T Stauf

Robin A Gardiner

Peter Van Buskirk

Jiming Zhang

An FT-IR toxic gas monitoring system and method for detection of one or more toxic gas species in a fluid environment containing or susceptible to presence of toxic gases. Such gas monitoring system includes: (1) a spectroscopic monitoring assembly for transmitting modulated infrared radiation through a spectroscopic cell that contains a gas sample from such fluid environment and generating a corresponding digitized spectrum characteristics of such gas sample for analysis; (2) a gas sampling and delivery subsystem for sampling the fluid environment and delivering the gas sample to the spectroscopic cell; and (3) a computational assembly (i) including a stored signal-to-noise ratio reference, and a stored background spectrum for the fluid environment when the toxic gas species is not present, and (ii) arranged to analyze the digitized spectrum and responsively produce an output indicative of quantitative presence of the toxic gas species in the fluid environment.

FOURIER TRANSFORM INFRARED (FTIR) SPECTROMETRIC TOXIC GAS MONITORING SYSTEM, AND METHOD OF DETECTING TOXIC GAS SPECIES IN A FLUID ENVIRONMENT CONTAINING OR SUSCEPTIBLE TO THE PRESENCE OF SUCH TOXIC GAS SPECIES

A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated temperature. A carrier gas may be flowed past the flash vaporization matrix structure to yield a carrier gas mixture containing the flash vaporized source reagent. The matrix structure preferably has a high surface-to-volume ratio, and may suitably comprise a foraminous matrix element such as screen mesh onto which the reagent source liquid is distributed for flash vaporization. The invention is particularly useful for delivery of Group II reagents and compounds and complexes of early transition metals such as zirconium and hafnium, and may be usefully employed with Group II beta-diketonate source layers, e.g., of YBaCuO, BiSrCaCuO, and TlBaCaCuO types, as well as for forming interlayers of Group II metal fluorides between superconductor or gallium arsenide overlayers, and for depositing thin films of photonic and ferroelectric materials, e.g., BaTiO.sub.3, Ba.sub.x Sr.sub.1-x Nb.sub.2 O.sub.6, and PbZr.sub.1-x Ti.sub.x O.sub.3.

Source reagent liquid delivery apparatus, and chemical vapor deposition

A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated temperature. A carrier gas may be flowed past the flash vaporzation matrix structure to yield a carrier gas mixture containing the flash vaporized source reagent. The matrix structure preferably has a high surface-to-volume ratio, and may sutiably comprise a foraminous matrix element such as screen mesh onto which the reagent source liquid is distributed for flash vaporization. The invention is particularly useful for delivery of Group II reagents and compounds and complexes of early transition metals such as zirconium and hafnium, and may be usefully employed with Group II beta-diketonate source layers, e.g., of YBaCuO, BiSrCaCuO, and TlBaCaCuO types, as well as for forming interlayers of Group II metal fluorides between superconductor or gallium arsenide overlayers, and for depositing thin films of photonic and ferroelectric materials, e.g., BaTiO.sub.3, Ba.sub.x Sr.sub.1-x Nb.sub.2 O.sub.6, and PbZr.sub.1-x Ti.sub.x O.sub.3.

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Bethlehem, CT, United States of America

Robin L Binder