Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Robertus Mathijs Gerardus Rijs

Nicolaas Rudolf Kemper

Frits Van Der Meulen

Theo Anjes Maria Ruijl

Peter Paul Hempenius

Youssef Karel Maria De Vos

Jeroen Dekkers

Paul Corné Henri De Wit

Johannes Cornelius Antonius Muller

Stijn Willem Boere

Michael Johannes Vervoordeldonk

Johannes Petrus Martinus Bernardus Vermeulen

Marc Wilhelmus Maria Van Der Wijst

Theodorus Petrus Maria Cadee

Jan Van Eijk

Frank Johannes Jacobus Van Boxtel

Martijn Houben

Antonius Franciscus Johannes De Groot

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Günes Nakiboglu

Mark Constant Johannes Baggen

Martinus Van Duijnhoven

Jan Willem Bruggers

Sander Kerssemakers

Ronald Maarten Schneider

Hendrikus Herman Marie Cox

Richard Henricus Adrianus Van Lieshout

Olav Johannes Seijger

Marco Hendrikus Hermanus Oude Nijhuis

Thomas Petrus Hendricus Warmerdam

Silvester Matheus Reijnders

Hubert Gerard Jean Joseph Amaury Vroomen

Alexander Petrus Josephus Van Lankvelt

Ingmar August Kerp

Gerard Johannes Boogaard

Erwin Antonius Henricus Franciscus Van Den Boogaert

Jessica Henrica Anna Verdonschot

Theo Anges Maria Ruijl

Richardus Simon Antonius Oostveen

Alexander Maurice Steenhoek

The invention relates to a vibration isolation system (VIS) comprising: &#x2014;a base (); &#x2014;a coupling element () to be coupled to a vibration sensitive object; &#x2014;a vibration isolator (-) arranged between the base and the coupling element; &#x2014;a bellows () to be arranged between the VIS coupling element or the vibration isolator and a protective housing () surrounding the vibration sensitive object; and &#x2014;one or more separate damping elements to act on convolutions of the bellows.

Vibration isolation system and lithographic apparatus

A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

Lithographic apparatus, object positioning system and device manufacturing method

A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber () in communication with the compartment and a perforated plate (), having a plurality of through-holes (), between the chamber and the compartment.

Lithographic apparatus

A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

System for positioning an object in lithography

A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

Stage system and a lithographic apparatus

The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced. Furthermore the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber, the fan unit communicating with the outlet for creating under pressure in the interior space of the nozzle in operating conditions.

Suction unit and autonomous vacuum cleaner

Actuator arrangement with an actuator (), a reference mass (), a spring () and a first sensor (). The actuator () applies a force between a first object () relative to a second object (). The reference mass () is, in use, supported by a third object () by means of the spring (). The first sensor () generates a first distance signal that depends on a first distance (z; z,z; z,z) between the reference mass () and the first object () and is provided to a controller () to actuate the actuator ().

Actuator arrangement for active vibration isolation comprising an inertial reference mass

A device () comprises at least a body () and a bumper () which is movably attached to the body so as to protect the body from shock caused by collision with an obstacle during movement of the device across a surface. The bumper is attached to the body by means of at least one spring () extending in a direction which is at least substantially perpendicular to the direction into which the bumper is movable with respect to the body. Furthermore, a robot cleaner comprising such a device is provided.

Device comprising at least a body and a bumper, and robot cleaner comprising such a device

Actuator arrangement with an actuator (), a reference mass (), a spring () and a first sensor (). The actuator () applies a force between a first object () and to a second object (). The reference mass () is, in use, supported by a third object () by means of the spring (). The first sensor () generates a first distance signal that depends on a first distance (z; z, z; z, z) between the reference mass () and the first object () and is applied to a controller () to actuate the actuator ().

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Eindhoven, Netherlands

Robertus Mathijs Gerardus Rijs