Asml Holding N.v.

Asml Netherlands B.v.

Roberto B Wiener

Richard Carl Zimmerman

Peter Conrad Kochersperger

Pradeep Kumar Govil

Alexander Kremer

Elizabeth Stone

Kalyan Kumar Mankala

Andrew Nelson

Justin Lloyd Kreuzer

Heine Melle Mulder

Santiago E Del Puerto

Lev Ryzhikov

Hendrikus Robertus Marie Van Greevenbroek

James G Tsacoyeanes

Martinus Agnes Willem Cuijpers

Scott Douglas Coston

James Hamilton Walsh

Eric Brian Catey

Aage Bendiksen

Arun Mahadevan Venkataraman

David A Hult

Michal Emanuel Pawlowski

Kirill Urievich Sobolev

Boris Kogan

Robert Jeffrey Wade

Christopher Michael Dohan

Michael Emerson Brown

Shaun Evans

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

Method for region of interest processing for reticle particle detection

Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

Reticle gripper damper and isolation system for lithographic apparatuses

A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.

Linear motor magnetic shield apparatus for lithographic systems

Linear motor magnetic shield apparatus

A beam pointing and positioning system includes a first lens, movable in a first plane perpendicular to a nominal optical axis, which receives and positions a light beam. The system also includes a second lens, movable in a second plane perpendicular to the nominal optical axis, which receives and points the positioned light beam. The system is thereby capable of directing the light beam to a desired location at a desired angle. The system may also include a beam splitter that receives, transmits, and reflects the pointed light beam, one or more sensors that receive the reflected light beam, and a controller coupled to the sensor(s) and first and second lenses. The controller may control the positioning of the first and second lenses based on beam position and pointing data and/or signals received from the sensor(s). A method of positioning and pointing a light beam is also presented.

Beam positioning and pointing

In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.

Cooling of actuator coils

A method, system and computer program product to control position of an error control module in a lithography apparatus using a servo control loop is described herein. The system comprises a filter, a servo controller coupled to the filter and configured to receive a control signal and an actuator coupled to the servo controller and configured to control the position of the error control module. The filter is configured to filter the control signal by modulating the amplitude and phase of the control signal in a desired frequency range, prior to the servo control loop.

Pre-filter for a servo control loop, and applications thereof

An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error.

Illumination system with low telecentricity error and dynamic telecentricity correction

Systems and methods are provides for measuring and correcting for a given telecentricity in a lithographic apparatus. A radiation beam is partitioned into a plurality of beams, each of which is modulated using an array of individually controllable elements and projected onto a portion of a substrate through a projection system. A set of alignment beams is transmitted simultaneously on paths similar to those traversed by the plurality of radiation beams, and a corresponding set of sensors respectively measures an angle and a position of the set of alignment beams proximate to an entrance of the projection system. An assembly of telecentricity control mirrors (TCM) adjusts appropriate ones of the plurality of radiation beams in response to the measurement to correct for any detected telecentricity errors.

Real time telecentricity measurement

A system is configured to compensate for guide flatness errors and/or shifting of a support. The system can include one or more support devices, fluid or magnetic bearings to guide the one or more support devices along a guide, and a compensation system. The compensation system is coupled to respective ones of the one or more support devices adjacent to each of the fluid or magnetic bearings. The compensation system is configured to generate a rotational motion that compensates for tilting in the support devices compensate for any non-straight areas of the guide or shifting (e.g., thermal shifting) of the support devices, which is done through moving of the support devices with respect to the guides during movement of the support devices along the guide.

Compensation techniques for fluid and magnetic bearings

A system and method for uniformity correction having light leak and shadow compensation is provided. The system includes multiple correction elements and an optical compensation plate. Adjacent correction elements are separated by a gap. The optical compensation plate includes a pattern having multiple gap compensation segments. The pattern has an attenuation which is different than the attenuation of the remaining portions of the optical compensation plate. The location of each compensation segment on the compensation plate corresponds to the location of the corresponding gap between adjacent correction elements in the illumination slot. The width of each compensation segment is dependent upon the angle of the light incident on the correction system. The pattern can be located on the top surface or on the bottom surface of the compensation plate. In addition, the compensation plate can be located above or below the plurality of correction elements.

Uniformity correction system having light leak and shadow compensation

A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.

System and method for uniformity correction

A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. 'pupils' are then superimposed onto the grid. Multiple second grids are also defined. Each '&#x201c;pupil'&#x201d; is mapped to a second grid such that the center of the second grid is coincident with the &#x201c;&#x201c;pupil&#x201d;&#x201d; center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and &#x201c;&#x201c;pupil&#x201d;&#x201d; mappings.

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Bethel, CT, United States of America

Roberto B Wiener