Qualcomm Incorporated

Robert Won Chol Kim

Vaishnav Srinivas

Renatas Jakushokas

David Ian West

Philip Michael Clovis

Jan Christian Diffenderfer

Yuehchun Claire Cheng

Guneet Singh

Systems and methods for delay control are described herein. In one embodiment, a delay circuit comprises a first delay path and a second delay path. The delay circuit also comprises a plurality of switches, wherein each switch is coupled between different points on the first and second delay paths, and each switch is configured to turn on or off in response to a respective one of a plurality of select signals. The delay circuit further comprises a multiplexer having a first input coupled to an output of the first delay path, a second input coupled to an output of the second delay path, and an output coupled to an output of the delay circuit, wherein the multiplexer is configured to selectively couple one of the outputs of the first and second delay paths to the output of the delay circuit in response to a second select signal.

Delay circuit

Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, and a third electrode formed from a third metal layer, wherein second and third electrodes are spaced farther apart than the first and second electrodes. The capacitor structure also comprises a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third metal layers, wherein the second dielectric layer has a larger thickness than the first dielectric layer. The first electrode is coupled to a first power-supply rail, the third electrode is coupled to a second power-supply rail, and the second power-supply rail has a higher power-supply voltage than the first power-supply rail.

Metal-insulator-metal capacitor structures

Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a low-voltage capacitor and a high-voltage capacitor. The low-voltage capacitor comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, a third electrode formed from a third metal layer, a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third electrodes. The high-voltage capacitor comprises a fourth electrode formed from the first metal layer, a fifth electrode formed from the third metal layer, and a third dielectric layer between the fourth and fifth electrodes, wherein the third dielectric layer is thicker than either the first dielectric layer or the second dielectric layer.

An integrated circuit includes core logic and a plurality of interface blocks disposed about a periphery of the core logic. A plurality of input or output (I/O) circuits is assigned to one of the plurality of interface blocks. The I/O circuits include external I/O circuits coupled to a device other than the integrated circuit and internal I/O circuits coupled to the integrated circuit. Each interface block includes a first plurality of I/O circuits disposed on a first side of the interface block and a second plurality of I/O circuits disposed on a second side of the interface block. Each interface block also includes interface logic for the interface block between the first plurality of I/O circuits and the second plurality of I/O circuits, and a logic hub that includes a clock distribution of minimal length that drives launch logic and capture logic to form the I/O circuits of the interface block.

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San Marcos, CA, United States of America

Robert Won Chol Kim