Kla Tencor Corporation

Kla-tencor Technologies Corporation

Robert W Walsh

Damon Floyd Kvamme

David Alles

Michael J Wright

Daniel L Belin

Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.

Auto focus system for reticle inspection

Disclosed is an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.

Multiple beam inspection apparatus and method

Disclosed in an optical inspection system for inspecting the surface of a substrate. The optical inspection system includes a light source for emitting an incident light beam along an optical axis and a first set of optical elements arranged for separating the incident light beam into a plurality of light beams, directing the plurality of light beams to intersect with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system further includes a light detector arrangement including individual light detectors that correspond to individual ones of a plurality of reflected or transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate. The light detectors are arranged for sensing the light intensity of either the reflected or transmitted light.

Disclosed is an optical inspection system for inspecting the surface of a substrate. The inspection system includes a light source for emitting a light beam along an optical axis and a first set of optical elements arranged for separating the light beam into a plurality of light beams, directing the plurality of light beams to intersection with the surface of the substrate, and focusing the plurality of light beams to a plurality of scanning spots on the surface of the substrate. The inspection system also includes a second set of optical elements adapted for collecting a plurality of transmitted light beams caused by the intersection of the plurality of light beams with the surface of the substrate and a light detector arrangement including individual light detectors that each receive individual ones of the plurality of transmitted light beams. The light detectors are arranged for sensing the light intensity of the transmitted light beams.

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Cupertino, CA, United States of America

Robert W Walsh