Lsi Logic Corporation

Robert W Davis

John D Corbeil, Jr

Sandeep Bhutani

Randall E Bach

Payman Zarkesh-Ha

Qian Cui

Daniel W Prevedel

Sangjune Park

Prabhakaran Krishnamurthy

A method and computer program product for parasitic extraction from a previously calculated capacitance solution include steps of: (a) receiving as input a design database for an integrated circuit design; (b) receiving as input a first set of operating conditions and a second set of operating conditions for the integrated circuit design; (c) calculating a first resistance solution and a single capacitance solution from the design database and the first set of operating conditions; (d) performing a parasitic extraction of the first resistance solution and the single capacitance solution to generate a first set of parasitic values; (e) calculating a second resistance solution from the design database and the second set of operating conditions; (f) performing a parasitic extraction of the second resistance solution and the single capacitance solution to generate a second set of parasitic values; and (g) generating as output the first set of parasitic values and the second set of parasitic values.

Method of parasitic extraction from a previously calculated capacitance solution

A method of calculating delay for a process variation includes finding a value for each of exactly two independent variables that results in a maximum or minimum variation of estimated cell delay plus net delay, calculating a variation of resistance from the value found for each of the exactly two independent variables, calculating a variation of capacitance from the value found for each of the exactly two independent variables, adding the calculated variation of resistance to a net resistance to generate a modified net resistance for a selected net, adding the calculated variation of capacitance to a net capacitance to generate a modified net capacitance for the selected net, and calculating the cell delay plus net delay from the modified net resistance and the modified net capacitance.

Method of delay calculation for variation in interconnect metal process

A method of characterizing a total width and an overall effective length for a bent gate. The bent gate is divided into logical portions, and each of the logical portions is designated as one of a bent portion, a corner portion, and a straight portion. A corner portion gate width and a corner portion effective length are computed for each of the logical portions designated as a corner portion. Similarly, a bent portion gate width and a bent portion effective length are computed for each of the logical portions designated as a bent portion. Likewise, a straight portion gate width and a straight portion effective length are computed for each of the logical portions designated as a straight portion. The total width of the bent gate is computed from the corner portion gate width, the bent portion gate width, and the straight portion gate width. Similarly, the overall effective length of the bent gate is computed from the corner portion effective length, the bent portion effective length, and the straight portion effective length.

Bent gate transistor modeling

A method identifies the cause of poor correlation between an integrated circuit model and measured integrated circuit performance. The method includes determining the propagation delays through two separate integrated circuit components. The propagation delays are then compared to each other to identify the cause of the poor correlation.

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Robert W Davis