Texas Instruments Corporation

Robert T Turner

Sidney G Parker

Craig A Fischer

Jerry Wood

Method and apparatus are disclosed for depositing a uniform layer of material, such as titanium dioxide, on the surface of an object, such as a silicon sphere of a solar array (7). Component gases are injected at predetermined rates into a heated reaction chamber (5) where they react. Because of the reaction rate and injection velocities of the gases, the reaction is substantially completed at a calculated location inside the reaction chamber (5). The object which is to receive the layer, such as the solar array (7), is placed at the calculated location in the reaction chamber (5). The platform (68) to which the solar array (7) is attached is simultaneously tilted and rotated such that all areas of the surface of the array (7) are uniformly exposed to the titanium dioxide reactant.

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Dallas, TX, United States of America

Robert T Turner