Telik, Inc.

Cv Therapeutics, Inc.

Applied Materials, Inc.

Other

Arris Pharmaceutical Corporation

Robert T Lum

Steven R Schow

Michael M Wick

Michael R Kozlowski

Wayne R Spevak

Alison Joly

Richard L Mackman

Prasad V V S V Manchem

Suresh Kerwar

Songyuan Shi

Cheri Lynn Blum

Sourabh Mishra

Marek G Nelson

David Walter Groechel

Ramin Emami

Hugo O Villar

Chiu Chan

Li Wu

Lisa Wang

Fred Conrad Redeker

Jeff A Zablocki

Hung Chih Chen

Prabha N Ibrahim

Rajeev Bajaj

Lawrence M Kauvar

Brian J Brown

Stephan D Parent

Jurg R Pfister

George Frederic Schreiner

John W Patterson

Jeffery A Zablocki

Young Jeen Paik

Louise Robinson

Pavel E Zhichkin

Matthew H Lyttle

Fanying Meng

R Jason Herr

Chester A Szwejkowski

Heinz W Gschwend

Robert W Macsata

Thomas Redelmeier

Prabbha Ibrahim

Sophia Park

Micheal M Wick

Jeong Weon Park

Thierry Fried

Elaine Kuo

Barr E Bauer

Ken Rice

Satyasrayan Kumaraswamy

Chunsheng Qiao

Jason R Herr

Pavel Zhichkin

Among other things, a method comprises polishing a surface of a substrate by applying a pressure between the surface of a substrate and a surface of a polishing pad. The surface of the polishing pad defines one or more grooves separated by one or more partition regions. The one or more grooves have an initial depth before the polishing starts and extend from an initial outer surface of the one or more partition regions to an initial bottom of the one or more grooves. The method also comprises removing material below an initial bottom of the one or more grooves such that a distance between an outer surface of the one or more partition regions and a bottom of the one or more grooves remain substantially the same as the initial depth.

Conditioning of grooving in polishing pads

Disclosed herein are tablets comprising ezatiostat hydrochloride wherein the ezatiostat hydrochloride comprises from about 75 to about 82 percent by weight of the tablet.

Tablet formulation of ezatiostat

An article of manufacture, a method, and an apparatus for use in a chemical mechanical polishing system is provided. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a polishing surface, the polishing surface including a first polishing portion having a first polishing material of a first hardness for polishing a first portion of the substrate, and a second polishing portion having a second polishing material of a second hardness for polishing a second portion of the substrate. The article of manufacturer may be disposed on a rotatable, stationary, or linear platen for processing a substrate. In another aspect, a method is provided for processing a substrate, including providing a platen containing the polishing article disposed on the rotatable platen, delivering a polishing composition to the polishing article, and contacting a substrate on the polishing article.

Multi-phase polishing pad

Compounds of the following formula are provided: In the Formula (I), Ris &#x2014;X&#x2014;R'; in which R&#x2032; is optionally substituted lower alkyl, optionally substituted aryl, optionally substituted heteroaryl, or optionally substituted heterocyclyl, and X is &#x2014;NH&#x2014;. Ris lower alkyl optionally substituted with one, two or three groups chosen from hydroxy, lower alkoxy, and halogen. And Ris &#x2014;NRR; in which Ris hydrogen and Ris lower alkyl substituted with amino; or (ii) Rand Rare both lower alkyl optionally substituted with one, two or three groups chosen from hydroxy and amino. It is to be understood that R&#x2032; is not cyclohexylmethyl, phenyl, substituted phenyl, benzyl, phenylethyl, or m-hydroxybenzyl. The compounds inhibit CDK-2 activity and are useful for treating disorders characterized by undesirable cell proliferation.

Purine inhibitors of cyclin dependent kinase 2 and I&#x3ba;B-&#x3b1;

Compounds of formula I are useful for treating conditions associated with hyperglycemia, especially Type II diabetes. These compounds are useful in stimulating the kinase activity of the insulin receptor, activating the insulin receptor, and stimulating the uptake of glucose. Pharmaceutical compositions comprising the antidiabetic compounds are also disclosed.

Naphthalene ureas as glucose uptake enhancers

Generally, a method and apparatus for processing a substrate. In one embodiment, the method provides a first relative motion between at least a first substrate and a polishing material. A second relative motion is provided between at least a second substrate and the polishing material. The changing in direction of the relative motion extends the interval between conditioning procedures used to return the polishing material to a state that produces uniform polishing results.

System and method for chemical mechanical planarization

Pharmaceutical compositions and methods of using them. Lipid formulations of a glutathione analog and methods of manufacturing them. Their use to stimulate hematopoiesis, protect hematopoietic cells from damage caused by radiation or chemotherapy, or potentiate the stimulatory action of one or a combination of cytokines on colony formation by hematopoietic progenitor cells, protect a subject from a destructive effect of a chemotherapeutic agent or irradiation, or to potentiate the effect of a chemotherapeutic agent.

Therapeutic compositions containing glutathione analogs

An article of manufacture, a method, and an apparatus for use in a chemical mechanical polishing system is provided. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a polishing surface, the polishing surface including a first polishing portion having a first polishing material of a first hardness for polishing a first portion of the substrate, and a second polishing portion having a second polishing material of a second hardness for polishing a second portion of the substrate. The article of manufacture may be disposed on a rotatable, stationary, or linear platen for processing a substrate. In another aspect, a method is provided for processing a substrate, including providing a platen containing the polishing article disposed on the rotatable platen, delivering a polishing composition to the polishing article, and contacting a substrate on the polishing article.

Purine inhibitors of cyclin dependent kinase 2 & ikappabalpha

Purine inhibitors of cyclin dependent kinase 2 & IKBA

Alpha-ketoamide inhibitors of 20S proteasome

Methods for treating conditions associated with hyperglycemia, especially Type II diabetes, with novel naphthylsulfonic acids and related compounds. These compounds, as single stereoisomers or mixtures of stereoisomers, or their pharmaceutically acceptable salts, are useful in methods of stimulating the kinase activity of the insulin receptor, enhancing the activation of the insulin receptor by insulin, and stimulating the uptake of glucose into cells. A variety of antidiabetic compounds and pharmaceutical compositions comprising the antidiabetic compounds are also disclosed.

Naphthylsulfonic acids and related compounds as glucose uptake agonists

A method for determining whether a compound is an insulin receptor kinase activator.

Method for determining whether a compound is an insulin receptor kinase activator

Bis-(N,N&prime;-bis-(2-haloethyl)amino)phosphoramidates, pharmaceutical compositions containing them, methods of treatment using them, and processes for their preparation. The compounds possess anti-tumor activities or are capable of being modified to have anti-tumor activities; and this invention relates to the use of the compounds in methods for the treatment of tumors and, especially, for the treatment of cancer.

Bis-(N,N'-bis-(2-haloethyl)amino)phosphoramidates as antitumor agents

Substituted stilbenes as glucose uptake enhancers

Growing community of inventors

Palo Alto, CA, United States of America

Robert T Lum