Corning Incorporated

Momentive Performance Materials Gmbh

Robert Stephen Pavlik, Jr

Lisa Anne Moore

Robert Sabia

Susan Lee Schiefelbein

Daniel Raymond Sempolinski

Michael Lucien Genier

John T Brown

Donald M Trotter, Jr

Michael Henry Wasilewski

Michael William Price

Stephen Charles Currie

William Rogers Rosch

Katherine Rose Rossington

Keith J Donohue

Jeffrey L Sunderland

Amy J Naylor

Jessica L Neumann

James R Cole

John Edward Maxon

Konstantin Zuyev

Martin Panchula

Michael David Harris

Ben Matthew Gauthier

Lawrence Henry Kotacska

Nathan J Cassingham

Yan Zhou

Sandra L Burt

The invention is directed to calcium fluoride crystal optics with improved laser durability that can be used for the transmission of below 250 nanometer (nm) electromagnetic radiation. The optics consists of CaFas the major component and Mg in an amount in the range of 13 ppm to 20 ppm while Ce and Mn are &#x3c;0.5 ppm. The doped crystal and optics made therefrom have a ratio of 515/380 nm transmission loss of less than 0.3 after exposure to greater than 2.8 MRads of &#x3b3;-radiation. Further, the doped crystal and optics made therefrom exhibit a greatly improved lifetime as shown by ALDT testing to at least 1 billion pulses.

Calcium fluoride optics with improved laser durability

The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.

Silica glass having improved properties

The invention is directed to calcium fluoride crystal optics with improved laser durability that can be used for the transmission of below 250 nanometer (nm) electromagnetic radiation. The optics consist of CaFas the major component and, in one embodiment, at least one dopant/amount selected &#x3e;0.3-1200 ppm Mg, &#x3e;0.3-200 ppm Sr, &#x3e;0.3-200 ppm Ba, while Ce and Mn are &#x3c;0.5 ppm. The doped crystal and optics made therefrom have a ratio of 515/380 nm transmission loss of less than 0.3 after exposure to greater than 2.8 MRads of &#x3b3;-radiation.

A passively aligned optical isolator includes laminated layers of material including two polarizing glass layers sandwiching a Faraday rotator layer. Each polarizing glass layer comprises a glass matrix containing elongated metal particles exhibiting a change in polarization axis of less than about 0.0375&#xb0;/m over a distance of at least 8 mm, as measured across a major surface of the layer. The optical isolator has a contrast ratio greater than 40 dB.

Polarizers and isolators and methods of manufacture

Polarizing glass articles, optical isolators including polarizing glass articles, and methods of manufacturing polarizing glass articles and optical isolators are disclosed. The methods manufacture can be used to manufacture isolators exhibiting improved contrast ratio.

A fused silica production furnace and methods of producing fused silica are disclosed. The furnace and the methods involve using a foamed refractory having a network of interconnected pores.

Method and apparatus for fused silica production

High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1&times;10 molecules/cm of molecular hydrogen and low chlorine levels.

Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks

Methods for improving the strength of alumina refractory materials are disclosed. The method involves exposing the alumina material to a halogen gas. The treated materials can be used in furnaces for producing fused silica optical members.

Alumina refractories and methods of treatment

A method and furnace are described for producing a fused oxide body by decomposing a precursor compound of the oxide in a flame to form molten oxide particles and collecting those particles in a furnace constructed of a refractory material to form a fused oxide body, the improvement in the method comprising treating the refractory material with a strong acid in liquid form to react with, and thereby remove, contaminants from at least the surface of the refractory material.

Method for pure, fused oxide

An article of relatively pure silica, and a furnace and method of producing the article. The article is produced by collecting molten silica particles in a refractory furnace in which at least a portion of the refractory has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory.

Pure fused silica, furnace and method

An article of relatively pure silica, and a furnace and method of producing the article. The article is produced by collecting molten silica particles (,) in a refractory furnace in which at least a portion of the refractory has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory.

A method of producing, by flame hydrolysis, a fused silica glass containing titania which comprises delivering a mixture of a silica precursor and a titania precursor in vapor form to a flame, passing the vapor mixture through the flame to form SiO.sub.2 --TiO.sub.2 particles, and depositing the particles within a furnace where they melt to form a solid glass body.

Fused SiO.sub.2 -TiO.sub.2 glass method

A method of producing a sintered glass article from a fritted glass body, and preventing the body from adhering to a refractory carrier during the sintering step which comprises coating the refractory carrier with a thin, continuous layer of yttrium oxide.

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Corning, NY, United States of America

Robert Stephen Pavlik, Jr