Praxair Technology, Inc.

Robert Shih

Ashwini K Sinha

Lloyd Anthony Brown

Douglas Charles Heiderman

Serge Marius Campeau

Dragon Lu

Wen-Pin Chiu

Chien-Kang Kao

Dragonno Lu

A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.

Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation

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Hsinchu, Taiwan

Robert Shih