Air Products and Chemicals, Inc.

Robert Sam Zorich

David A Roberts

George Oleg Voloshin

David Silva

James Richard Thurmond

John Anthony Thomas Norman

Charles Michael Birtcher

Thomas Andrew Steidl

Lee Arthur Senecal

Gil Vivanco

John Eric Baker

Morteza Farnia

Geoffrey L Chase

Cynthia Lee Trent

David James Silva

A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single 'assembly' that permits ease of shipping, minimal end-user interaction, sufficient solvent for the solvent purge operation, without residual solvent, requiring disposal. This eliminates customer handling of the solvent, and eliminates the customer's need to find a solvent waste facility, as residual solvent can be returned in the same package in one piece/one step.

Multiple contents container assembly for ultrapure solvent purging

This invention relates to copper(+1)(&#x3b2;-diketonate)(L) and related copper complexes such as copper (+1)(&#x3b2;-ketoiminate)(L) represented by the formula:wherein X represents O or NR, Rand Rare each independently comprised of the group Calkyl, Cfluoroalkyl, aryl, Calkoxy, and Calkyl ethers and Ris H, Calkyl, Calkoxy, and halogen, Ris Calkyl, Cfluoroalkyl, phenyl, alkylphenyl, trialkylsilyl, and L represents a ligand having the structure:(R)(R)C&#x2550;(R)(R) or R&#x2014;C&#x2261;C&#x2014;Rwherein R, is comprised of the group Calkanol, Calkoxyalkanol, Cunsaturated alkoxyalkanol, trialkylsilanol, Caalkylamine, phenylamine; R, R, and Rare comprised of the group H, Calkyl, triakylsilyl, alkoxy or phenyl.

Copper CVD precursors with enhanced adhesion properties

This invention relates to an improvement in a purification process for producing those liquid copper based complexes of &bgr;-diketones and, particularly the monovalent copper complexes of &bgr;-diketones, which are suited for application by chemical vapor deposition in the electronics industry. In the basic process for preparing a copper based complex, a reactive copper compound is reacted with a fluorinated &bgr;-diketonate and an organo source such as an olefinic source or one having acetylenic unsaturation. Purification is effected by contacting reaction product with a double deionized deoxygenated water source and preferably an acid/water source. An aqueous layer and an organic layer are formed with the aqueous layer containing byproducts and the organic phase containing product.

Use of water and acidic water to purify liquid MOCVD precursors

A container for high purity chemicals having an externally placed level sensor to avoid contamination of such chemical and for ready serviceability and a removeable liquid out diptube to facilitate cleaning during refilling or refurbishing, both of which are situated adjacent a sump in the bottom of the container. The container can have a valved inlet and outlet and can be constructed of stainless steel which is electropolished.

High purity chemical container with external level sensor and liquid sump

A manifold for transfer of chemical, comprising; a heated first conduit for connecting a vessel for containing the chemical to a another vessel, a source of pressurized gas and a source of vacuum; a heated first block valve assembly having first and second diaphragm valves, each valve having a diaphragm and a valve seat side and a diaphragm side, wherein the valve seat side of each valve is juxtaposed to the valve seat side of the other valve, and each valve seat side of each valve communicating with the first conduit; a first connector in the first conduit for detaching the conduit from the vessel; a second conduit, for delivering chemical to the vessel, the second conduit connected to the diaphragm side of the first valve; and a third conduit, for communicating pressurized gas and vacuum to the first conduit, connected to the diaphragm side of the second valve.

Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals

A vacuum purge system is provided to protect the vacuum pump from becoming flooded with liquid that on occasion is purged with vapors from process equipment. The liquid is trapped in a vessel and then evaporated and exhausted through the vacuum pump as vapor. Evaporation of trapped liquid is effected by reducing or stopping the purge stream to the trapping vessel while continuing to operate the vacuum pump, thereby reducing the absolute pressure within the vessel. Evaporation of liquid can also be effected by supplying heat to the trapped vessel, either in cooperation with or instead of the pressure reduction. Use of a programmable logic controller enables a cyclic operation that traps liquid from entering the pump, removes the trapped liquid as vapor, and then resumes normal purge operation.

Self-cleaning vacuum purge system

Process for solvent purging a process line of process chemical in a process chemical delivery system typically used to dispense toxic chemicals from replaceable process chemical containers in the electronic fabrication industry.

Solvent purge mechanism

Apparatus and process for solvent purging a process line of process chemical in a process chemical delivery system typically used to dispense toxic chemicals from replaceable process chemical containers in the electronic fabrication industry.

Growing community of inventors

Carlsbad, CA, United States of America

Robert Sam Zorich