Texas Instruments Corporation

Robert Ray Spangler

Damien Thomas Gilmore

Ronald Charles Roth

Madhu Sudan Ramavajjala

Nicholas Andrew Kusek

Kenneth Ryan Thomas

Kristi Bushman

Stephen Arlon Meinser

Michael Glenn Williams

Ingu Song

A method of process control for a batch process includes pre-measuring a monitor lot to obtain pre-metrology data regarding at least a first process parameter. There are no product units included with the monitor lot. The pre-metrology data is saved together with an identifier for the first monitor unit. A batch is staged for the batch process including at least a first product lot including a plurality of product units together with the first monitor unit. The batch is batch processed through the batch process. After the batch processing, the first monitor unit is measured to obtain post-metrology data for the first process parameter. At least one of the post-metrology data and a difference between the post-metrology data and pre-metrology data is saved to a data file with an identifier for the first product lot or the pre-metrology data and post-metrology data is directly written to the first product lot.

Monitor data attachment to product lots for batch processes

A manufacturing process including a controller method to generate a tool setting which includes a tool offset and a device offset. The controller method uses a device parameter measurement to update the tool offset and device offset. A tool weight and a device weight is assigned so that only one of the tool offset and device offset is significantly changed during the update. The process may be applied to semiconductor device manufacturing and particularly to integrated circuit fabrication.

Process and method for a decoupled multi-parameter run-to-run controller

Growing community of inventors

Lucas, TX, United States of America

Robert Ray Spangler