University of Colorado

Siros Technologies, Inc.

Jds Uniphase Corporation

The General Hospital Corporation

Storage Technology Corporation

Research Investment Network, Inc.

Robert R McLeod

Mark E McDonald

Eric Moore

Andrew J Daiber

Lambertus Hesselink

Michael Christopher Cole

Sergei L Sochava

Guillermo J Tearney

Brett Eugene Bouma

Christopher Bowman

Adam Urness

Joseph A Gardecki

Linbo Liu

Tokuyuki Honda

David R Miller

Douglas E Crafts

Kuochou Tai

Kok-Wai Chang

Barthelemy Fondeur

Brian Lee Heffner

Jinxi Shen

Paulo Eduardo Xavier Da Silveira

Jeffrey W Stansbury

Qingdong Guo

Pang-Chen Sun

Ingolf Sander

Adam D Cohen

Stephanie Bryant

William Phillips

Timothy Francis Scott

Timothy M Slagle

Yong Ding

Marvin Dion Alim

Ray Snyder

Hong-Wei Mao

Karin A Payne

Xue Dong He

David Glugla

Virginia Ferguson

Sudheendran Mavila

Nancy Hadley-Miller

Amy C Sulivan

Parag K Shah

The present invention, in one aspect, relates to monomers and photopolymers that exhibit a high refractive index. The photopolymers of the invention have properties suitable for fabricating holographic optical elements (HOEs).

High dynamic range two-stage photopolymers

Various embodiments of the present technology generally relate to reflection suppressors. More specifically, some embodiments use elastomeric materials doped with optical absorbers for temporary suppression of Fresnel reflections for multiple substrates spanning wide spectral and angular bandwidth. The refractive index of the elastomer can be tuned to match a substrate and thereby minimize reflection. Some embodiments can use the addition of different absorptive dopants to allow for either broadband or wavelength-selective reflection suppression. As performance is limited only by index mismatch, both spectral and angular performance significantly exceed that of anti-reflection coatings. After use, these light traps may be removed and reused without damaging the substrate. These films have uses in spectroscopic ellipsometry, holography, and lithography.

Elastomeric reflection suppressor

The present disclosure relates in one aspect to methods of preparing non-homogeneous polymer materials wherein light is used to control structure and/or composition. In certain embodiments, the present disclosure provides methods for creating gradient index optical elements including holographic elements.

Holographic photopolymer compositions and composites

A photoinitiated polymerizable composition for 3D printing, the polymerizable composition comprising a nanogel component that comprises nanogel particles, wherein the nanogel particles comprise a copolymer with polymerizable reactive groups suitable for reacting with each other or a reactive diluent monomer, a reactive oligomer, a resin, or a combination thereof that is present in the polymerizable composition upon photoinitiation, wherein the nanogel component has a glass transition temperature that is in a range of about &#x2212;50 C and about 20 C and an average molecular weight that is in a range of about 10 kg/mol and about 100 kg/mol, and wherein the nanoparticles have an average hydrodynamic radius that is in a range of 1 nm to about 5 nm.

3D printing with polymeric nanogel particles

The present invention relates to the unexpected discovery of 3D printed biomimetics of growth plate cartilage and methods using the same for the treatment of growth plate defects. In certain embodiments, the methods prevent the growth of bony bars at the site of growth plate injury, thereby preventing growth arrest and/or deformity.

Biodegradable biomimetics of growth plate cartilage for the treatment of physeal injuries

Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

Liquid deposition photolithography

Exemplary embodiments of apparatus, systems and methods can be provided for providing at least one electro-magnetic radiation to at least one sample. For example, a plurality of wave-guiding arrangements can be provided which are configured to (i) provide the electro-magnetic radiation(s), and (ii) at a point of emission of each of the wave guiding arrangements, cause a phase of each of the electro-magnetic radiation(s) to have a predetermined value. The exemplary apparatus can be part of a probe. Further the exemplary apparatus can include an interferometric arrangement provided in communication with the probe and/or be part of the probe.

Systems, methods and computer-accessible medium which provide microscopic images of at least one anatomical structure at a particular resolution

Interferometric path length measurements using frequency-domain interferometry form the basis of several measurement techniques, including optical frequency domain reflectometry (OFDR), optical coherence tomography (OCT), and frequency-modulated continuous wave (FMCW) radar and lidar. A phase-sensitive and self-referenced approach to frequency-domain interferometry yields absolute and relative path length measurements with axial precision orders of magnitude better than the transform-limited axial resolution of the system.

Spectral phase analysis for precision ranging

Embodiments include methods, systems, and/or devices that may be used to create aberration-corrected gradient index lenses. In some embodiments, data related to aberration measurements is received. This data is processed and an inverse map is generated to compensate for the aberration measurements. An intensity pattern corresponding to the inverse map is then projected onto a blank lens (e.g., to locally polymerize a mobile monomer) to create an exposed lens with a gradient index to correct for the aberration measurement. For example, in some embodiments, the lens may be an intraocular lens and the data can be generated by using a wavefront sensor to measure aberrations (e.g., an optical phase profile to correct defocus or astigmatism) in a patient's eye.

Systems and methods for creating aberration-corrected gradient index lenses

A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.

Three-dimensional direct-write lithography

Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.

Diffraction unlimited photolithography

The frequency-sampling method is widely used to accommodate nonlinear electromagnetic source tuning in swept-wavelength interferometric techniques, such as optical frequency domain reflectometry (OFDR) and swept-wavelength optical coherence tomography (OCT). Two sources of sampling errors are associated with the frequency-sampling method. One source of error is the limit of an underlying approximation for long interferometer path mismatches and fast electromagnetic source tuning rates. A second source of error is transmission delays in data acquisition hardware. Aspects of the invention relate to a method and system for correcting sampling errors in swept-wavelength interferometry systems such that the two error sources correct sampling errors associated with the first radiation path and the second radiation path cancel to second order.

System and method for correcting sampling errors associated with radiation source tuning rate fluctuations in swept-wavelength interferometry

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Denver, CO, United States of America

Robert R McLeod