Lsi Logic Corporation

Lsi Corporation

Robert Muller

John V Jensen

Mark Simmons

Duane B Barber

A Pseudo Low Volume Reticle (PLVR) which consists of multiple design layers on a single reticle. Specifically, the reticle can include two instances of each layer in order to facilitate die-to-die inspection techniques. A scribe is wrapped around each instance of the layer, such that both the frame and active area of the chip can be inspected with the die-to-die method. The chip consists of design data for a given part. The scribe, or frame, is preferably standard data across products which is used for yield and in line testing during the chip manufacturing process. Since only one chip and scribe unit is necessary to manufacture a device at each layer, it is only necessary that one chip and scribe instance yield during the reticle manufacturing process.

Pseudo low volume reticle (PLVR) design for ASIC manufacturing

An embodiment of the present invention provides a novel method which makes LVR to HVR registration possible by wrapping the X and Y scribes around each instance of each layer on both the LVR and HVR reticles; standard HVR reticles and LVR reticles will not align to one another due to registration and electrical test structures in the scribe being in different locations. Another embodiment of the present invention addresses the loss of die per wafer due to increased scribe area when using LVR and HVR reticles in the same set.

Mixed LVR and HVR reticle set design for the processing of gate arrays, embedded arrays and rapid chip products

The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.

Lithography line width monitor reflecting chip-wide average feature size

An embodiment of the present invention provides a novel method which makes LVR to HVR registration possible by wrapping the X and Y scribes around each instance of each layer on both the LVR and HVR reticles; standard HVR reticles and LVR reticles will not align to one another due to registration and electrical test structures in the scribe being in different locations. Another embodiment of the present invention addresses the loss of die per wafer due to increased sribe area when using LVR and HVR reticles in the same set.

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Portland, OR, United States of America

Robert Muller