Hamamatsu-photonics K.k.

Energetiq Technology, Inc.

Robert M Grzybinski

Kosuke Saito

Stephen F Horne

Michael J Roderick

Wolfram Neff

A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.

Growing community of inventors

Gloucester, MA, United States of America

Robert M Grzybinski