Ivoclar Vivadent Ag

Technische Universitāt Wien

Align Technology, Inc.

Technische Universitäet Wien

Depuy Synthes Products, Inc.

Albert-ludwigs-universitaet Freiburg

Technicshe Universität Wien

Albert-ludwigs-universitat Freiburg

Synthes Gmbh

Robert Liska

Norbert Moszner

Christian Gorsche

Iris Lamparth

Jürgen Stampfl

Chunhua Li

Yan Chen

Srinivas Kaza

Urs Karl Fischer

Markus Kury

Peter Burtscher

Heinrich Gruber

Patrick Knaack

Volker Rheinberger

Ulrich Salz

Wolfgang Josef Wachter

Peter Dorfinger

Yohann Catel

Johannes Patzer

Christoph Appert

Paul Gauss

Konstanze Seidler

Kai Rist

György Harakaly

Roland Taschner

Beate Ganster

Monika Schuster

Xiaohua Qin

Franz Varga

Gernot Peer

Andreas Mautner

Daniel Bomze

Frank Zeuner

Thorsten Bock

Jörg Angermann

Urs-Karl Fischer

Ingo Krossing

Peter Gruber

Aleksandr Ovsianikov

Wolfgang Kern

Stefan Baudis

Moritz Mitterbauer

Bernhard Steyrer

Gerald Ullrich

Robert Inführ

Helga Lichtenegger

Astrid Gugg

Claudia Dworak

Günter Weigel

Helga Bergmeister

Christian Heller

Norbert Mozner

In a method for lithography-based generative production of three-dimensional components, in which material that can be solidified under the effect of electromagnetic radiation is arranged in a vat, a build platform is positioned at a distance from the vat bottom, material located between the build platform and the vat bottom is irradiated at selected locations with the aid of an irradiating unit, the electromagnetic radiation is introduced into the material from below through a vat bottom that is transmissive to the radiation, at least in a certain region, and successively focused on focal points within the material, whereby a volume element of the material that is respectively located at the focal point is solidified. The solidification takes place by means of multiphoton absorption and the volume of the focal point is varied at least once during the method, and so the component is built up from solidified volume elements of different volumes.

Method for lithography-based generative production of three-dimensional components

Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

Polymerizable monomers and method of polymerizing the same

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom

Dental material which comprises at least one compound of formula I, in which Ris a linear, branched or cyclic aliphatic C-Chydrocarbon radical or an aromatic C-Chydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more urethane groups, ester groups, oxygen atoms and/or sulfur atoms; X, Y, Z independently of each other in each case are &#x2014;COOR, &#x2014;CON(RR)&#x2014;, an aromatic C-Chydrocarbon radical or CN, wherein R, R, Rin each case independently of each other is hydrogen, a linear, branched or cyclic aliphatic C-Chydrocarbon radical or an aromatic C-Chydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more oxygen atoms, and m is 2 or 3.

Dental materials based on cyclopolymerizable crosslinkers

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition: Rrepresents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from &#x2014;Cl, &#x2014;Br, &#x2014;OH, &#x2550;O, &#x2014;NH&#x2014;CO&#x2014;OR, &#x2014;NH&#x2014;CO&#x2014;Ror free-radically or ionically polymerizable groups. Each Ris independently &#x2014;H or Calkyl; n is &#x2265;1. If n=1, Z and Y are absent and X represents &#x2014;OR; if n is &#x3e;1, Z represents &#x2014;OR&#x2014;, Y represents &#x2014;OR&#x2014; and X represents &#x2014;H or &#x2014;OH. Rrepresents &#x2014;H or R; and Rand Reach independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of Rare polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of Rto Rmay be linked to one another to form a ring or a dimer.

Photoinitiators for light-curable compositions

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition:  Rrepresents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from &#x2014;Cl, &#x2014;Br, &#x2014;OH, &#x2550;O, &#x2014;NH&#x2014;CO&#x2014; OR, &#x2014;NH&#x2014;CO&#x2014;Ror free-radically or ionically polymerizable groups. Each Ris independently &#x2014;H or Calkyl; n is &#x2265;1. If n=1, Z and Y are absent and X represents &#x2014;OR; if n is &#x3e;1, Z represents &#x2014;OR&#x2014;, Y represents &#x2014;ORs&#x2014; and X represents &#x2014;H or &#x2014;OH. Rrepresents &#x2014;H or R; and Rand Reach independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of Rare polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of Rto Rmay be linked to one another to form a ring or a dimer.

A light-curable composition is provided which may be used as a photopolymerizable material in an additive manufacturing process. The additive manufacturing process involves heating the light-curable composition which has a viscosity at 20&#xb0; C. of at least 20 Pa&#xb7;s. The light-curable composition includes a photopolymerizable matrix material, at least one thermoplastic polymer dissolved therein, and at least one photoinitiator. Polycaprolactone or a derivative thereof is used as the dissolved thermoplastic polymer.

Light-curable composition

Radically polymerizable composition which contains at least one vinyl ether according to general formula I: 

Polymer materials with unsaturated transfer reagents

Polymerizable compositions are described which contain, as photoinitiator, at least one acyltin compound according to the general formula (I): 

Polymerizable compositions with acyltin photoinitiators

The invention relates to the use of sulfonic acid esters of the following Formula 1 and/or Formula 2, individually or as a mixture of more than one thereof, as regulators in polymerization reactions of radically polymerizable, ethylenically unsaturated monomers: whereinA in each case independently is selected from H, CN, linear, branched or cyclic aliphatic or aromatic C-Chydrocarbon residues;X in each case independently is &#x2014;COO&#x2014; or &#x2014;CON(R)&#x2014;, wherein the binding to A occurs via O or N, or is absent if A is an aromatic hydrocarbon residue or CN;B in each case independently is selected from linear, branched or cyclic aliphatic or aromatic C-Chydrocarbon residues;Rin each case independently is selected from hydrogen and linear, branched or cyclic aliphatic or aromatic C-Chydrocarbon residues, which are optionally substituted with one or more OH groups, wherein the aliphatic hydrocarbon residues are optionally interrupted by one or more oxygen atoms; andn in each case independently is an integer from 1 to 6.

Sulfonic acid esters as regulators in radical polymerization reactions

Radically polymerizable silane according to the general formula I in which Ris a linear or branched aliphatic C-C-alkyl radical, phenyl or alkylated phenyl radical, R, Rindependently of each other in each case are absent or are a linear or branched aliphatic C-C-alkylene radical, which can be interrupted by S or O atoms, R, R, Rindependently of each other in each case are &#x2014;Cl, &#x2014;O&#x2014;CH, &#x2014;O&#x2014;CH, &#x2014;CHor &#x2014;CH, X is CHor O, Y is absent, or is O or NR', wherein R&#x2032; is H or a C-alkyl radical, and Z is absent, or is O, NR&#x2033;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;CO&#x2014;NR&#x2033;&#x2014;, &#x2014;O&#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;NR&#x2033;&#x2014;, or &#x2014;NR&#x2033;&#x2014;CO&#x2014;NR&#x2033;&#x2014;, wherein R&#x2033; is H or a C-alkyl radical and wherein the radicals Rand Rcannot be absent at the same time and Z is absent if Ror Ris absent, polycondensates based thereon and fillers surface-modified therewith.

Polymer materials with silane-based transfer reagents

Growing community of inventors

Schleinbach, Austria

Robert Liska