Cogent Light Technologies, Inc.

Microbeam Inc.

Robert L Piccioni

Douglas M Brenner

Glenn S Baker

Karlheinz Strobl

Robert Fischer

Michael Thomas

William P Robinson

Norman W Parker

An electromagnetic radiation source, such as an arc lamp, is located at a point displaced from the optical axis of a concave toroidal reflecting surface. The concave primary reflector focuses the radiation from the source at an off-axis image point that is displaced from the optical axis. The use of a toroidal reflecting surface enhances the collection efficiency into a small target, such as an optical fiber, relative to a spherical reflecting surface by substantially reducing aberrations caused by the off-axis geometry. A second concave reflector is placed opposite to the first reflector to enhance further the total flux collected by a small target. In accordance with one embodiment, the present invention is directed to devices in which the square of the off-axis distance divided by the radius of curvature is equal to or less than the extent of the source of electromagnetic radiation (y,/r&lE;s,).

Concentrating and collecting optical system using concave toroidal reflectors

An electromagnetic radiation source, such as an arc lamp, is located at a point displaced from the optical axis of a concave toroidal reflecting surface. The concave primary reflector focuses the radiation from the source at an off-axis image point that is displaced from the optical axis. The use of a toroidal reflecting surface enhances the collection efficiency into a small target, such as an optical fiber, relative to a spherical reflecting surface by substantially reducing aberrations caused by the off-axis geometry. A second concave reflector is placed opposite to the first reflector to enhance further the total flux collected by a small target.

Concentrating and collecting optical system using concave toroidal

The present invention comprises a system for condensing and collecting electromagnetic radiation having a primary reflector disposed on one side of an electromagnetic radiation source and a target disposed on the opposite side of the source. The primary reflector includes a concave reflecting surface portion, which preferably forms the entire surface of the reflector. The concave surface portion of the primary reflector, which is preferably of a substantially toroidal shape, defines an optical axis and a primary center of curvature disposed along the optical axis. The source of electromagnetic radiation is located approximately on the optical axis but axially offset a first distance from the center of curvature in a direction toward the concave surface portion. The target, such as a single core fiber optic or a fiber optic bundle, is located approximately on the optical axis but axially offset a second distance from the center of curvature in a direction away from the concave surface portion for acquiring a substantially focused image of the source reflected by the concave surface portion. With this configuration, the first and second distances are approximately related by the equation (1-z.sub.s /r1).times.(1-z.sub.i /r1)=1 where z.sub.s is the first distance, z.sub.i is the second distance and r1 is the primary radius of curvature of the toroidal reflecting surface portion of the primary reflector when a toroidal reflector is used for partial compensation of aberrations. In an alternate embodiment, a secondary reflector may further be added behind the source on the side opposite the primary reflector to enhance further light collection. According to a second alternate embodiment, the system may also comprise a housing having sides with inner surfaces forming the primary reflector and the secondary reflector.

Condensing and collecting optical system with axially displaced concave

An off-axis optical system for collecting and condensing electromagnetic radiation utilizes an ellipsoidal reflector or a portion thereof configured so that the effects of magnification and optical aberrations (caused by the off-axis arrangement and an aspherical source envelope) are minimized. This is accomplished by the utilization of a specially designed ellipsoidal reflector having primary and secondary focal points along the major axis of the reflector or an effective reflecting portion thereof defined as that portion which is both illuminated by the source and subtended by the acceptance cone of the target. In the preferred embodiment, a single ellipsoidal reflector is configured with its major axis both non coincident with its geometric optical axis and with the optical axis of the target at an angle greater than zero degrees so as to reduce substantially the distance at which a focused image is formed and to achieve an average magnification near unity thereby maintaining the brightness of the source at the target. The radiant flux at the location of the target can be increased by incorporating a retro-reflector of toroidal or spherical design. In a second embodiment, the components forming the optical system of the present invention are arranged in a self-contained nautilus-shaped housing wherein the inner surface of the housing preferably comprises a reflector encompassing the retro-reflector, an effective ellipsoidal reflecting portion and a window through which the image is projected onto the target. In a third embodiment, the present invention utilizes a compound ellipsoidal reflector configuration having two ellipsoidal reflecting surfaces arranged so as to have a common focus, at which point a radiation source is located. In this embodiment, two targets located at the remaining foci of the respective reflectors are illuminated with a high flux density.

Condensing and collecting optical system using an ellipsoidal reflector

Apparatus and method for repairing semiconductor masks and reticles is disclosed, utilizing a focused ion beam system capable of delivering, from a single ion beam column, several different species of focused ion beams, each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate, and clear defects are filled in at high rates directly from the beam by deposition of a metallic or other substance compatible with the mask materials. A focused ion beam column able to produce precisely focused ion beams is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source containing suitable atomic species is employed.

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Thousand Oaks, CA, United States of America

Robert L Piccioni