Aviza Technology Limited

Trikon Equipments Limited

Trikon Technologies Limited

Spp Process Technology Systems UK Limited

Robert Kenneth Trowell

Gordon R Green

Gary Proudfoot

John MacNeil

Andrew Isaac Jeffryes

Christopher David George

Paulo Edurado Lima

Carl David M Brancher

This invention relates to a broad beam ion deposition apparatus () including an ion source (), a target (), a tillable substrate table () and an auxiliary port (). The target () is in the form of a carousel which carries a number of targets and the ion source () is configured to produce a substantially rectangular section beam ().

Ion deposition apparatus having rotatable carousel for supporting a plurality of targets

This invention relates to an Ion gun () which comprises of plasma generator () driven from an RF source (), a plasma or source chamber (), having an outlet (), across which is mounted an accelerator grid (). The accelerator grid () comprises four individual grids. The first grid (), which is closest to the outlet (), is maintained at a positive voltage by a DC source (), the second grid () is maintained strongly negative by DC source (). The third grid () is maintained at a negative voltage, which is much lower than that of the second grid (), by DC source () and the fourth grid is grounded. Means of mounting these grids are also described.

Ion source including separate support systems for accelerator grids

This invention relates to magnetic assemblies and, in particular, to assemblies which are useful for inducing magnetic fields within vacuum chambers. Thus a magnetic assembly, generally indicated atincludes the rectangular magnetically soft corecarrying windingswhich together form the main planar electromagnet, generally indicated atand immediately adjacent the edges of the magnetare placed auxiliary coilsCoilsare each formed from windingswound around oblate coresand it would be noted that they project upwardly above the upper surface of the planar magnetPole piecesare attached to the ends of the planar magnetand these two project above the upper surface of the planar magnetThe assembly is completed by mounting brackets

Magnet assemblies

This invention relates to a shutter for use in physical vapour deposition apparatus having a chamber. The shutter, generally indicated at, is located in a side housingof the vacuum chamber, whilst sputtering is taking place. Once the substrateis treated, the substrate is removed from the chamber and the shutter is brought in to an operative position above a wafer pedestal or supportThe shutter is mounted on an armusing a fixing boss, the arm and the boss being magnetically coupled.

Shutter

A seal is formed between two parts of a high pressured chamber by means of a rigid ring, which is formed with curved surfaces, that engage with an anvil and an enclosure part, the anvil having a similar curved projection. At least one of the engaging surfaces is coated with a soft metal e.g. silver.

High pressure seal

A seal is formed between two parts of a high pressured chamber by means of a rigid ring (,), which is formed with curved surfaces (,), that engage with an anvil (,) and an enclosure part (,), the anvil (,) having a similar curved projection (,). At least one of the engaging surfaces is coated with a soft metal e.g. silver.

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Bristol, United Kingdom

Robert Kenneth Trowell