3m Innovative Properties Company

Robert J Streifel

Daniel B Pendergrass, Jr

Michael J Muilenburg

John J Gagliardi

Wesley J Bruxvoort

Richard J Webb

Jerry J Fizel

Chong-Yong J Kim

Gary B Forsberg

Charles R Kummeth

A process for planarizing, polishing, or providing other modification of a wafer surface or other workpiece. The process includes using an abrasive article having a textured abrasive coating affixed to a backing. The abrasive article includes a monitoring element, such as a window, to allow transmission of radiation therethrough. The radiation level is monitored throughout the planarization process to determine the approach of the desired endpoint. The window in the abrasive coating can be an area devoid of abrasive coating or having minimal or a thinned abrasive coating.

Abrasive article having a window system for polishing wafers, and methods

An apparatus and method for abrasively processing an article involves the use of an abrasive product provided with a machine discernable pattern representative of information of varying types. The pattern is read while the abrasive product moves relative to the article, and is used to control the movement of the abrasive product relative to the article. The pattern may include one or more of a machine discernable electrical characteristic, optical characteristic, topographic characteristic or magnetic characteristic. Reading the pattern may involve one or more of electrically, optically, mechanically or magnetically reading the machine discernable pattern provided on the abrasive product. The pattern may include one or more of indicia, protrusions, depressions, holes, voids, color or pigment variations, bar codes, magnetic transitions or periodic markings. The pattern may include one or more of indexing information, servo information, alignment information or abrasive product identification information. Closed-loop servo control of abrasive product movement may be effected using the servo/indexing pattern information. The abrasive product may constitute a movable pad and an abrasive slurry. The pad may be moved in a controlled manner relative to the article such that the pad and the abrasive slurry abrasively contact the article. The pattern provided on the pad may be read subsequent to a cleaning operation. An information system may be used to store various types of data derived, in part, from use of the abrasive product pattern information. The stored data may be used for a variety of identification, tracking, accounting, inventory, handling, and statistical purposes.

Abrasive processing apparatus and method employing encoded abrasive product

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Woodbury, MN, United States of America

Robert J Streifel