International Business Machines Corporation

Robert J Owen

Kostas I Papathomas

Anilkumar Chinuprasad Bhatt

Ashwinkumar C Bhatt

Gerald Walter Jones

Joseph Alphonse Kotylo

Nageshwer Rao Bantu

Anaya Kumar Vardya

Voya Rista Markovich

Carlos Juan Sambucetti

Lisa Jeanine Jimarez

William H Lawrence

Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.

Photoresist develop and strip solvent compositions and method for their

A method for depositing a conductive metal onto a dielectric substrate is provided. The method includes obtaining a metal sheet having a roughened surface that has the following parameters:

Depositing a conductive metal onto a substrate

Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.

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Binghamton, NY, United States of America

Robert J Owen