Asml Netherlands B.v.

Asml Holding N.v.

Robert-Han Munnig Schmidt

Erik Roelof Loopstra

Jan Van Eijk

Pieter Willem Herman De Jager

Felix Godfried Peter Peeters

Gerard Van Schothorst

Johannes Catharinus Hubertus Mulkens

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Johannes Petrus Martinus Bernardus Vermeulen

Christiaan Louis Valentin

Fransiscus Hendrikus Van Deuren

Hans Butler

Johannes Jacobus Matheus Baselmans

Engelbertus Antonius Fransiscus Van Der Pasch

Andre Bernardus Jeunink

Cheng-Qun Gui

Harmen Klaas Van Der Schoot

Marc Wilhelmus Maria Van Der Wijst

Johannes Onvlee

Theodorus Petrus Maria Cadee

Antonius Franciscus Johannes De Groot

Huibert Visser

Edwin Johan Buis

Marcel Koenraad Marie Baggen

Jan Frederik Hoogkamp

Anastasius Jacobus Anicetus Bruinsma

Yim Bun P Kwan

Sebastiaan Maria Johannes Cornelissen

Fransiscus Mathijs Jacobs

Henri Johannes Petrus Vink

Rob Jansen

Andreas B G Ariens

Michel Pieter Dansberg

Robert Johannes Petrus Van Diesen

Engelbertus A F Van De Pasch

Theodorus Leonardus Van Den Akker

David William Callan

George Howard Robbins

Bartholomeus Catharina Thomas Van Bree

A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.

Substrate handling apparatus and lithographic apparatus

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless

In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.

Lithographic apparatus, radiation supply and device manufacturing method

Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.

A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

Lithographic apparatus

A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

Methods and systems for lithographic beam generation

A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

A system and method allow for more than one substrate to be simultaneously moved and/or positioned on a support table. In one example, this is accomplished through use of a frame that either supports or separates one or more substrates for either transport or positioning on a support table. In another example, this is accomplished through use of spacers on a support table, which are used to properly position one or more substrates. In yet another example, this is accomplished through use of a robot placing one or more substrates on the support table.

Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates

A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

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Hapert, Netherlands

Robert-Han Munnig Schmidt