Asml Netherlands B.v.

Robert Gordon Livesey

Johannes Henricus Wilhelmus Jacobs

Barrie Dudley Brewster

Jan Frederik Hoogkamp

Johannes Hendrikus Gertrudis Franssen

Josephus Cornelius Johannes Antonius Vugts

Albert Jan Hendrik Klomp

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Johannes Petrus Martinus Bernardus Vermeulen

Hernes Jacobs

Wilhelmus Josephus Box

Antonius Johannes Josephus Van Dijsseldonk

Vladimir Vitalevitch Ivanov

Bastiaan Theodoor Wolschrijn

Bastiaan Matthias Mertens

Marius Ravensbergen

Martinus Arnoldus Henricus Terken

Pieter Johannes Marius Van Groos

Mustafa Amhaouch

Franciscus Catharina Bernardus Marinus Van Vroonhoven

A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.

Load lock and method for transferring objects

A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

Lithographic device, device manufacturing method and device manufactured thereby

A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

Method and apparatus for maintaining a machine part

A lithographic apparatus includes a patterning device for patterning a beam of radiation, a projection system for projecting the patterned beam of radiation onto a substrate, a gas purged sealing aperture extending between different zones of the apparatus, and a gas supply arrangement for supplying a mixture of at least argon and hydrogen to the sealing aperture.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.

Lithographic apparatus

Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.

Lithographic projection assembly, load lock and method for transferring objects

A sealing assembly for sealing a slit between two regions in a lithographic apparatus is disclosed. The assembly includes a vacuum pumping device that extends substantially in a longitudinal slit direction for at least partially preventing particle transmission in a transversal slit direction.

Sealing assembly, a lithographic projection apparatus, and a device manufacturing method

Growing community of inventors

Haywards Heath, United Kingdom

Robert Gordon Livesey