Asml Netherlands B.v.

Asml Holding N.v.

Robert Gabriël Maria Lansbergen

Martinus Hendrikus Antonius Leenders

Erik Roelof Loopstra

Frits Van Der Meulen

Paul Janssen

Derk Servatius Gertruda Brouns

Matthias Kruizinga

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Maarten Mathijs Marinus Jansen

Jérôme François Sylvain Virgile Van Loo

Jorge Manuel Azeredo Lima

Marc Bruijn

Ronald Harm Gunther Kramer

Gert-Jan Heerens

George Hilary Harrold

Erik Leonardus Ham

Angelo Cesar Peter De Klerk

Silvester Matheus Reijnders

Roland Jacobus Johannes Kerstens

Michel Loos

Geert Middel

Frank Johannes Christiaan Theuerzeit

Anne Johannes Wilhelmus Van Lievenoogen

Jacobus Maria Dings

Maurice Leonardus Johannes Janssen

Johannes Hubertus Josephina Moors

Hendricus Johannes Maria Meijer

Stephen Roux

Richard Joseph Bruls

Matthew Lipson

Peter Conrad Kochersperger

Joseph Harry Lyons

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Hans Meiling

Erik Willem Bogaart

Bastiaan Matthias Mertens

Sandra Van Der Graaf

Mohammad Reza Kamali

Richard John Johnson

David Ramirez

Martinus Jozef Maria Kester

Hugo Jacobus Gerardus Van Der Weijden

Sander Van Den Heijkant

Nicolaas Ten Kate

Pieter Willem Herman De Jager

Antonius Theodorus Anna Maria Derksen

Jacobus Johannus Leonardus Hendricus Verspay

Andrey Alexandrovich Nikipelov

Olav Waldemar Vladimir Frijns

Henricus Gerardus Tegenbosch

Sander Kerssemakers

Arindam Sinharoy

Matthew James Van Doren

Aukje Arianne Annette Kastelijn

Sipke Jacob Bijlsma

Martinus Jozef Maria Kesters

Xugang Xiong

Ellart Alexander Meijer

Ellard Alexander Meijer

A vessel () for an EUV radiation source, the vessel comprising a first opening () for accessing an interior () of the vessel, a first access member () configured to allow or prevent access to the interior of the vessel through the first opening, a second opening () for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member () arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

Vessel for a radiation source

A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector () and an electron accelerator (). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target () and a beam splitter () arranged to direct the a first portion of the electron beam along a first path towards a first side of the target () and to direct a second portion of the electron beam along a second path towards a second side of the target ().

Radioisotope production

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Rapid exchange device for lithography reticles

An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.

Lithographic apparatus and device manufacturing method

A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications.

Robot for in-vacuum use

The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device

A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.

Lithographic apparatus and patterning device transport

According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

Growing community of inventors

Schiedam, Netherlands

Robert Gabriël Maria Lansbergen