University of California

Robert G Patterson

Ronald G Musket

Shawn D Lammers

An improved Faraday cup array for determining the dose of ions delivered to a substrate during ion implantation and for monitoring the uniformity of the dose delivered to the substrate. The improved Faraday cup array incorporates a variable size ion beam aperture by changing only an insertable plate that defines the aperture without changing the position of the Faraday cups which are positioned for the operation of the largest ion beam aperture. The design enables the dose sensitivity range, typically 10  ions/cm to be extended to below 10 ions/cm . The insertable plate/aperture arrangement is structurally simple and enables scaling to aperture areas between <1 cm and >750 cm , and enables ultra-high vacuum (UHV) applications by incorporation of UHV-compatible materials.

Growing community of inventors

Dublin, CA, United States of America

Robert G Patterson