Agere Systems Inc.

Robert Francis Jones

William Daniel Bevers

Erik Cho Houge

John Martin McIntosh

Leonard Jay Olmer

Joseph William Buckfeller

Edward Paul Martin, Jr

James L Flack

Bennett J Ross

A system () for monitoring and controlling a fabrication process includes at least a first subsystem (), a crystallographic analysis subsystem (), and a second subsystem (), wherein the first subsystem and second subsystem perform respective fabrication steps on a workpiece. The crystallographic analysis subsystem may be coupled to both the first subsystem and second subsystem. The analysis subsystem acquires crystallographic information from the workpiece after the workpiece undergoes a fabrication step by the first subsystem and then provides information, based on the crystallographic information acquired, for modifying parameters associated with the respective fabrication steps. The system may also include neural networks () to adaptively modify, based on historical process data (), parameters provided to the respective fabrication steps. The analysis subsystem may include a electromagnetic source (), a detector (), a processor (), a controller () and a scanning actuator ().

Monitoring and control of a fabrication process

A process for cleaning the silicon surface of a semiconductor device material layer. The surface undergoes a pre-clean process followed by exposure to a nitrogen-containing gas. A polysilicon layer is formed on the surface in the same chamber and at about the same temperature as the cleaning and nitrogen exposing steps.

In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor

Described herein are apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes. A bypass loop is provided in fluid connection from either the process line or the vent line. In the bypass loop is a flow detector, such as a digitized mass flow controller. The flow detector takes one or more measurements of flow of gas from a mass flow controller, and data from such one or more measurements is used to provide information about the accuracy and/or precision of the mass flow controller. Also disclosed are ways to correct for back pressure or back vacuum in the process line.

Bypass loop gas flow calibration

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Clermont, FL, United States of America

Robert Francis Jones