Dow Corning Corporation

Other

Robert F Jarvis, Jr

Steven K Freeburne

Richard Barry Kaner

Brian M Naasz

Bruce Robert Crum

Jonathan Ashley Brinson

Stephen Paul Ferguson

Philippe R Bonneau

Rande Treece

John B Wiley

Gordon L Warrick

Kimberly K Oltmanns

Darrel L Whiteley

Edward G Gillan

A process for the production of monosilanes from the high-boiling residue resulting from the reaction of hydrogen chloride with silicon metalloid in a process typically referred to as the 'direct process.' The process comprises contacting a high-boiling residue resulting from the reaction of hydrogen chloride and silicon metalloid, with hydrogen gas in the presence of a catalytic amount of aluminum trichloride effective in promoting conversion of the high-boiling residue to monosilanes. The present process results in conversion of the high-boiling residue to monosilanes. At least a portion of the aluminum trichloride catalyst required for conduct of the process may be formed in situ during conduct of the direct process and isolation of the high-boiling residue.

Conversion of direct process high-boiling residue to monosilanes

A hydrochlorination process for the production of monosilanes from the high-boiling residue resulting from the reaction of organochlorides with silicon metalloid in a process typically referred to as the 'direct process.' The process comprises (A) forming a mixture comprising the high-boiling residue and an organosilane and (B) contacting the mixture with hydrogen chloride in the presence of a catalytic amount of a catalyst composition effective in promoting the formation of monosilanes from the high-boiling residue. A preferred catalyst composition comprises aluminum trichloride, at least a portion of which may be formed in situ during conduct of the direct process and isolation of the high-boiling residue.

Hydrochlorination process for converting high-boiling residue from

A one-step process for the production of monosilanes from the high-boiling residue resulting from the reaction of organochlorides with silicon metalloid in a process typically referred to as the 'direct process.' The process comprises contacting a mixture comprising the high-boiling residue, an organotrichlorosilane, and hydrogen chloride with a catalytic amount of catalyst composition effective in promoting the formation of monosilanes from the high-boiling residue. A preferred catalyst composition comprises aluminum trichloride, at least a portion of which may be formed in situ during conduct of the direct process and isolation of the high-boiling residue. Typically, the monosilane product of the present process comprises almost exclusively methyltrichlorosilane and tetrachlorosilane.

One step process for converting high-boiling residue from direct process

A process for the production of monosilanes from the high-boiling residue resulting from the reaction of organochlorides with silicon metalloid in a process typically referred to as the 'direct process.' The present process comprises forming a mixture comprising an organosilane and the high-boiling residue and contacting the mixture in the presence of hydrogen gas with a catalytic amount of a catalyst composition effective in promoting the formation of monosilanes from the high-boiling residue. A preferred catalyst composition comprises aluminum trichloride, at least a portion of which may be formed in situ during conduct of the direct process and isolation of the high-boiling residue.

Conversion of high-boiling residue from direct process to monosilanes

A process for the production of monosilanes from the high-boiling residue resulting from the reaction of organohalides with silicon metalloid in a process typically referred to as the 'direct process.' The present process comprises forming a mixture comprising an organotrihalosilane and the high-boiling residue in the presence of hydrogen gas and a catalytic amount of aluminum trichloride. The present process results in consumption of the organotrihalosilane rather than a net increase which typically occurs in processes for hydrogenation of the high-boiling residue. At least a portion of the catalytic amount of aluminum trichloride may be formed in situ during conduct of the direct process and isolation of the high-boiling residue.

Alumimum trichloride catalyzed hydrogenation of high-boiling residue

A process for producing a refractory material having the form TB.sub.o, e.g. zirconium nitride (ZrN), includes a first step of mixing a first salt having the form TX.sub.n, e.g. zirconium tetrachloride (ZrCl.sub.4) and a second salt having the form A.sub.m B, e.g. lithium nitride (Li.sub.3 N) in a ratio of n/m in a container. The process also includes a second step of igniting the mixture of the first and second salts, e.g. ZrCl.sub.4 and Li.sub.3 N, whereby the refractory material, e.g. ZrN, is produced along with byproducts having forms nAX and (n/m-o)B, e.g. 4LiCl and (1/6)N.sub.2, respectively. The process further includes a third step of separating the refractory material from the byproducts by solvent extraction. The stoichiometric ratio of the second salt to the first salt is n/m, e.g. 4/3. T is selected from the group consisting of transition metals, e.g. zirconium, and tetrelides, i.e. carbon, silicon, germanium, tin and lead. X is selected from the halide group consisting of fluorine, chlorine, bromine and iodine. A is selected from the group consisting of alkali metals, i.e. lithium, sodium, potassium, rubidium and cesium, and alkaline earth metals, i.e. beryllium, magnesium, calcium, strontium and barium. B is a base selected from the group consisting of pnictides, i.e. nitrogen, hosphorus, arsenic, antimony and bismuth, and tetrelides, i.e. carbon, silicon, germanium, tin and lead, m and n are integers and o is a fraction, e.g. 3/3=1.

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Union, KY, United States of America

Robert F Jarvis, Jr