Aixtron Se

Paralax, LLC

Robert Eugene Weisse

Stephen E Savas

Stephen E Hilliker

Richard Keith Karlquist

Described herein are techniques for supplying radio frequency (RF) power to a large area plasma source so as to produce a plasma that is substantially uniform in two spatial dimensions. The RF power may be supplied by a power supply system, which may comprise a RF source and a distribution network. The distribution network may comprise a matching network, and a branching circuit that divides the RF power into several branches. Each of the branches of the distribution network may include a phase shifter that shifts the RF signal (which carries the RF power) by an odd multiple of 90&#xb0;, and a blocking filter which blocks any harmonics and other unwanted frequencies which are reflected from a plasma source. The output of the branches may be coupled to feed points that are spatially distributed over the one or more electrodes of the plasma source.

System and method for distributing RF power to a plasma source

An improved vacuum variable capacitor can include one or more characteristics that provide advantages over previous vacuum variable capacitors. In particular, the vacuum variable capacitor can be constructed so as to enable the capacitance to be adjusted more easily, reduce parasitic electrical characteristics that degrade the performance of the vacuum variable capacitor, increase the strength of the capacitor plates of the vacuum variable capacitor, reduce the size of the vacuum variable capacitor, and/or make the shape of the vacuum variable capacitor more easily integrated into a system of which the vacuum variable capacitor is part.

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San Jose, CA, United States of America

Robert Eugene Weisse