Ebner Industrieofenbau Gmbh

Ebner Industrieofenbau Gesellschaft M.b.h.

Adpv Cigs Ltd.

Famatec Gmbh

Robert Ebner

Chih-Yung Hsiung

Ghassan Barbar

Kanaparin Ariyawong

Ulrich Pschebezin

Andreas Sauschlager

Heribert Lochner

Alexander Pocherdorfer

Peter Ladner

Martin Lauber

Bernard D Jones

Fritz Josef Ebner

Günther Fröhlich

Günter Grillberger

Manoj Kumar

Dean C Skelton

Gerald Eckertsberger

Thomas S McGee

Roland Lukatsch

Eduard Morbitzer

Bernd Gruhn

Gerhard Denk

Tong Li

Rudolf Steinheimer

Anton Oppermann

Leopold Götsch

Lukas Heitzmann

Daniel Schatz

Günter Kirschner

Mustafa Music

Harald Humer

Alfred Spitzenberger

Igor Grujic

Peter Seemann

Thomas Fuchs

Uwe Keim

Martin Rechberger

Jong Kwan Park

Gourav Sen

Gunter Kirschner

Bernard Jones

Sascha Eppensteiner

A method for growing crystals using PVT or PVD or CVD, includes: providing: a chamber for crystal growth, a crucible in the chamber including at least one deposition section with a seed crystal and a base material for crystal growth, at least one temperature monitoring device, a gas supply device and at least one fluid inlet and outlet, and a pressure monitoring device; evacuating the chamber using a pumping device; flushing the chamber with inert gas; heating the chamber to a growth temperature of 2000 to 2400° C. using at least one heating device; decreasing pressure to 0.1 to 100 mbar; supplying a dopant (during a growth process); regulating process parameters in the growth process; increasing chamber pressure at the growth process end; cooling down the chamber; wherein the heating of the chamber from an ambient temperature to the growth temperature occurs within 10 to 10000 minutes.

Method for growing crystals

A crucible device for growing crystals includes a container being arrangeable in a heating chamber of a heating apparatus, and a seed fixture element. The container includes a base section and the seed fixture element includes a seed surface which is configured for attaching a seed crystal. The seed fixture element is moveable coupled to the base section such that the distance between the seed surface and the base section is adjustable.

Crystal growth apparatus with movable seed fixture

A crucible device includes a heating chamber, at least a first crucible in which a first crystal is growable, and at least a second crucible in which a second crystal is growable. The first crucible and the second crucible are arranged within the heating chamber spaced apart from each other along a horizontal and vertical and any orientational direction. The crucible device further comprises a heating system arranged within the heating chamber, wherein the heating system is configured for adjusting a temperature along the horizontal and vertical and any orientational directions.

Apparatus for heating multiple crucibles

A device for producing single crystals of silicon carbide has a furnace and a chamber with a crucible and a seed crystal, the chamber being accommodated in the furnace, wherein a base material containing silicon carbide is arranged in the crucible, wherein the base material contains a mixture of silicon carbide powder and silicon carbide lumps.

Device for producing silicon carbide single crystals

The present invention relates to an apparatus for growing crystals. The apparatus comprises a chamber and a crucible being arranged in a heatable accommodation space of the chamber, wherein the crucible comprises an inner volume which is configured for growing crystals inside. The crucible comprises a bottom from which respective side walls extend to a top section of the crucible. The crucible comprises at least one a deposition section which is configured for attaching a seed crystal, wherein the deposition section is formed on at least one of the side wall and the top section of the crucible.

Crystal growth apparatus

The present invention relates to a device for carrying component parts to be temperature-controlled, in particular coiled metal strips or metal wires, in a temperature-control device. The carrier device has a base body and a carrier element, to which a component part is attachable, wherein the carrier element is detachably attached to the base body. The base body has a transport coupling, which is configured such that the transport coupling is detachably fixable to a handling system for handling the device.

Portable carrier device for a furnace charge and handling system for the carrier device

The invention relates to a device for temperature-controlling a component part. The device has a temperature-control zone, along which the component part is movable along a conveying direction. The temperature-control zone is configured to temperature-control at least one temperature-control section of the component part. Furthermore, the device has a temperature-control zone controller, which is configured to cover a covering region of the temperature-control zone such that in the covering region a temperature-control effect from the temperature-control zone on the temperature-control section of the component part is reducible. Herein, the temperature-control zone controller is configured so as to adjust the size of the covering region.

Temperature control device for the temperature control of a component

A strip flotation furnace for controlling the temperature of a metal strip has a flotation nozzle bar extending through the furnace transversely to a strip running direction of the strip. The flotation nozzle bar has two opposing first flotation nozzle rows spaced apart by a central region of the flotation nozzle bar. The rows are set up so that corresponding flotation nozzle jets, with a directional component toward the central region, can be generated to provide pressure cushioning for metal strip guiding. A temperature-control nozzle bar extends transversely to and is spaced apart from the flotation nozzle bar along the strip running direction. The temperature-control nozzle bar has two additional opposing temperature-control nozzle rows spaced apart by an additional temperature-control nozzle bar central region. These rows are set up so that corresponding temperature-control nozzle jets, with a directional component opposite to the additional central region, can be generated.

Strip flotation furnace

An arrangement for heat treating component parts. The arrangement has a first temperature control station for heat treating component parts and a second temperature control station for heat treating component parts, wherein the first temperature control station and the second temperature control station each have a temperature control device, on each of which a functional device is placeable. The functional device is a charging device for carrying component parts to be temperature-controlled or a device of the temperature control device. The arrangement further has a charging station, on which the functional device is placeable, and a handling system for handling the functional device, wherein the handling system is configured to convey the functional device between the charging station, the first temperature control station and the second temperature control station.

Arrangement having plural temperature-control stations for heat treating component parts, and their handling

The present invention relates to a temperature-control unit for a furnace device for heat treating a plate, in particular a metal plate. The temperature-control unit has a temperature-control body, which is arrangeable in a furnace chamber of the furnace device. The temperature-control body has a plurality of receiving bores. Furthermore, the temperature-control unit has a plurality of temperature-control pins, wherein the temperature-control pins are mounted in the receiving bores movably relative to the temperature-control body. The temperature-control pins are controllable in such a way that a temperature-control group of the temperature-control pins is extendable from the temperature-control body in the direction towards the plate, so that a thermal contact between the temperature-control group of the temperature-control pins and a predetermined temperature-control zone of the plate is generatable.

Temperature-control unit for a furnace device for heat treating a plate

The present invention relates to a furnace device for heating a plate, in particular a metal plate, by convection. The furnace device has a housing, in which a temperature control region for temperature-controlling a component part and an adjustment region are formed, wherein the adjustment region has a temperature control device for adjusting a temperature of a temperature control fluid. Further, the furnace device has a positioning device for positioning the plate in the temperature control region in a predetermined orientation, and a ventilator, which is arranged in the housing and which is adapted to circulate the temperature control fluid in the housing between the temperature control region and the adjustment region such that the temperature control fluid is flowable in a flow direction along a surface of the plate.

Convection furnace

The present invention relates to a continuous furnace system for heat treating a metal component, in particular an aluminium strip. The continuous furnace system has a first heating unit, in which the metal component is heatable for solution annealing up to a first temperature in the range of from 350&#xb0; C. to 700&#xb0; C., a cooling unit, in which the metal component is coolable from 300&#xb0; C. to 750&#xb0; C. down to 70&#xb0; C. to 250&#xb0; C., and a second heating unit, in which the metal component is heatable up to from 150&#xb0; C. to 290&#xb0; C. The first heating unit, the cooling unit, and the second heating unit both have a common support structure, on which the first heating unit, the cooling unit, and the second heating unit are fixed together. Furthermore, the continuous furnace system has a common conveyor track, which extends through the first heating unit, the cooling unit, and the second heating unit, wherein the conveyor track is configured in such a way that the metal component is passable along the conveyor track in the conveying direction through the first heating unit, the cooling unit, and the second heating unit for heat treatment.

Continuous furnace for aluminum strips

A nozzle system for a band floating system for floatingly guiding a band-shaped material having a nozzle body having a front edge area and a rear edge area opposite to the front edge area, a front gas nozzle arrangement arranged at the front edge area, a rear gas nozzle arrangement arranged at the rear edge area, and a nozzle arrangement arranged, in the conveying direction, in front of the front gas nozzle arrangement and/or behind the rear gas nozzle arrangement such that a liquid fluid is flowable in a fluid jet into a nozzle floating field in the direction towards a band running plane for temperature-controlling the band-shaped material.

Gas-cushion-type strip-supporting system having a nozzle system

The present invention relates to an oven device for heat-treating a blank. The oven device has an oven housing having an oven chamber, in which the blank can be heat-treated with a defined temperature, and a tempering body, which is arranged in the oven chamber. Furthermore, the oven device has a tempering body and a tempering device. The tempering device is arranged within the oven chamber movably between a first position and a second position, such that the tempering device is, at least in the first position, in thermal contact with the tempering body and can, in the second position, be brought in thermal contact with the blank.

Oven device for heat-treating a metal blank

Embodiments of the present invention relate to a handling device for handling a metal component part between a furnace device and a further processing device. The handling device comprises a temperature-control chamber, in which the metal component part can be inserted, and a conveying device. The temperature-control chamber comprises a temperature-control unit that adjusts a temperature in the temperature-control chamber. The temperature-control chamber can be conveyed between a receiving position, in which the metal component part can be conveyed from the furnace device into the temperature-control chamber, and a dispensing position, in which the metal component part can be conveyed from the temperature control chamber to the further processing device. The conveying device is configured in such a manner that the metal component part can be conveyed in the receiving position by means of the conveying device between the furnace device and the temperature-control chamber and that the metal component part can be conveyed in the dispensing position by means of the conveying device between the temperature-control chamber and the further processing device.

Handling device

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Leonding, Austria

Robert Ebner