Genvac Aerospace Corporation

Bav Technologies, Ltd.

Robert E Kusner

Gerald T Mearini

Laszlo A Takacs

Hsiung Chen

A method of manufacturing an x-ray target by positioning an x-ray target having an alloy surface and a graphite surface in a sputtering chamber is disclosed. The x-ray target is then coated over the graphite surface with non-hydrogenated amorphous carbon.

Process for coating amorphous carbon coating on to an x-ray target

A method of manufacturing an x-ray target by positioning an x-ray target having an alloy surface and a graphite surface in a sputtering chamber. The x-ray target is then coated over the graphite surface with non-hydrogenated amorphous carbon.

An apparatus and method for improving the performance of a vacuum coating system includes a vacuum chamber enclosing a track. The track is substantially rectangular having a top surface and a bottom surface. A pair of legs are attached to the bottom surface of the track and support the track within the vacuum chamber. The legs have a top edge engaging the bottom surface of the track and a bottom edge secured to a bottom section of the vacuum chamber. The legs extend longitudinally along the bottom surface of the track. A rail is mounted on the top surface of the track and extends along a longitudinal axis of the track. A substantially planar platter having a top face and a bottom face is supported on top of the rail. The platter is adapted to slide from side to side along the rail across the length of the track. A stage carrying an electron beam evaporator is mounted on the top face of the platter. As such, the electron beam evaporator slides with the platter across the length of the track. A linear substrate feed assembly is disposed above the stage for feeding a substrate through the vacuum chamber. As the substrate travels through the vacuum chamber, it is coated by a deposition material transmitted from the electron beam evaporator.

Electron beam evaporation assembly for high uniform thin film

A process for depositing diamond crystals onto a field emission cathode. The process involves providing a cathode having a substrate, a gate layer and a plurality of emitters electrically insulated from the gate layer. An electric bias is applied to the gate layer and a ground potential is applied to the emitters. A heat source is positioned adjacent the cathode, and the cathode is exposed to a field of ions for a sufficient period to at least partially clean the emitters. A carbon containing gas is added to the atmosphere adjacent to the cathode such that carbon ions are dissociated from the gas and deposited on the emitters to form a 'soot'. The temperature of the cathode is then adjusted to a level which allows formation of diamond film.

Growing community of inventors

Solon, OH, United States of America

Robert E Kusner