Jds Uniphase Corporation

Optical Coating Laboratory, Inc.

Other

Robert E Klinger

Georg J Ockenfuss

Markus K Tilsch

Robert B Sargent

Karen Denise Hendrix

Richard Ian Seddon

Charles Andrew Hulse

Kim Leong Tan

Edward Gratrix

William T Beauchamp

Marc A Kamerling

Jeremy Hayes

Derek Rollins

Frederik Kevin Zernik

Scott E Solberg

David Casale

William Spitzmacher

Adam Bergeron

C Andrew Hulse

John P Lehan

A method for selectively coating the tops of pins of a pin chuck with a high thermal stability material, such as diamond-like carbon (DLC). Non-pin areas ('valleys') of the pin chuck support surface are temporarily covered with glass frit or glass beads during the DLC coating operation. After coating, the glass frit/beads masking material may be removed, leaving the DLC material selectively coating the pin tops. The selective DLC coating avoids the cracking or warping problems due to CTE mismatch when DLC is coated over the entire pin chuck support surface, as the pin chuck material typically is very different from DLC.

Methods for masking a pin chuck, and articles made thereby

The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.

Magnetron sputtering device

An oblique angle deposition is used to provide an A-plate optical retarder having at least one dense, form-birefringent layer. According to one embodiment, the dense, form-birefringent layer(s) are deposited as part of an FBAR stack to provide an all-dielectric full-function A/&#x2212;C-plate trim retarder for LCD birefringence compensation. Advantageously, the dense structure of the full-function A/&#x2212;C-plate trim retarder offers high durability and/or stability, thus making it well suited for providing polarization compensation in high light flux polarization-based projection systems.

Thin-film optical retarders

A wavelength-tunable add/drop device for adding or dropping n channels having different center wavelengths is disclosed. A first multicavity variable optical filter for selectably operable to passing one channel while reflecting n&#x2212;1 other channels depends upon a location where light is launched into an end of the multicavity optical filter. A broadband optical reflector is disposed directly adjacent to the multicavity variable optical filter and disposed between planes coincident with the first and second surfaces of the variable filter, the broadband reflector having a reflectivity that will reflect all n channels of light. Preferably, the broadband reflector is disposed distal from the bottom and top layers of the multicavity filter and is adjacent to the middle layers or near the middle of the multicavity filter layers.

Tunable optical add/drop device

A multilayer optical interference filter having a multiplicity of optical cavities separated by a dielectric reflector stacks to achieve either a very narrow passband region or sharp transition between the passband and reflective region is substantially free of stress to preserve the desired optical performance upon fabrication into miniature discrete filter elements. The substantial stress reduction is achieved by removing the filter from the substrate used in the deposition process in a controlled manner to preserve the structural integrity of the resulting free standing multilayer film structure. The structure can be further bonded or attached to other optical components to suppress a thermal shift in center wavelength without reintroducing stress or interposing a massive substrate in the optical path through the filter.

Stress free and thermally stabilized dielectric fiber

An optical coupler device is provided with gradient index first and second lenses, with each lens having an outer endface with one or more ports at a predetermined location defined by a waveguide such as an optical fiber. A narrow bandpass optical filter is disposed between inner endfaces of the first and second lenses. In one embodiment, the second lens is in coaxial mechanical alignment with the first lens so as to have a common optical axis. An input waveguide and an optional reflection waveguide are disposed on the outer endface of the first lens on opposite sides of the optical axis. A transmission waveguide is disposed on one side of the outer endface of the second lens and is positioned at a non-zero angle with respect to the optical axis in order to compensate for a previously unrecognized lateral beam displacement caused by the optical filter. In other embodiments, the input waveguide and optional reflection waveguide are angled, or the optical axis of the second lens is laterally offset from the optical axis of the first lens, to compensate for the lateral beam displacement and thereby improve coupling efficiency.

Optical coupler device for dense wavelength division multiplexing

An absorbing anti-reflection coating which can be applied directly to the faceplate of a video display such as a cathode ray tube or a plasma display by physical or chemical vapor deposition comprises at least 3 materials: L, a low retractive index material such as the metal oxide SiO.sub.2 ; H, a high refractive index material such as the metal oxide Nb.sub.2 O.sub.5 ; and M, a metal or metallic alloy or metallic compound layer with a refractive index greater than 0.5 and extinction coefficient less than 5. Preferably the materials are used in the design MHLHL or HMHL. The design and materials provide broadband performance with a low layer count. The single metal layer design permits relatively low values of sheet resistance (high conductivity). Transmittance values are high, typically 70%.+-.5%. Reflectance typically is .ltoreq.0.6%.

Absorbing anti-reflection coatings for computer displays

A system and process for forming optical quality, protective, relatively thick, thin film coatings on workpieces such as detectors or solar cells. The apparatus includes a rotary cylindrical sputtering system which incorporates separate deposition devices and at least one chemical reaction device for simultaneously (1) depositing materials which form tensile and compressive oxides and (2) oxidizing the deposited materials. The system also includes a stressometer system, preferably a cantilevered beam stressometer system which monitors the stress of the depositing film in-situ. The monitored stress levels are used to control the relative amounts of compressive and tensile materials which are deposited and, thus, control stress in the thin film coatings. In a preferred embodiment for forming protective covers on solar cells, the deposition devices are linear magnetron sputter cathode devices having silicon and aluminum targets, and the reaction device is a linear magnetron ion source oxidizer device. Film stress in the thin film coating is controlled by controlling power to the silicon and aluminum targets.

Growing community of inventors

Rohnert Park, CA, United States of America

Robert E Klinger