Tektronix, Inc.

Technical Visions Inc.

Robert D Hinchliffe

Mark Windsor Roberson

Kevin J Ilcisin

Thomas S Buzak

Paul C Martin

John S Moore

Donald E Kephart

Kevin J IIcisin

Dorothy L Blazo

Cathode structure for a palc panel

A channel structure for a PALC display panel comprises a channel member defining at least one channel, a cathode having an upper surface exposed in the channel, and an anode having an upper surface exposed in the channel. The upper surface of the anode is of substantially uniform composition and has a conductivity perpendicular to its upper surface of at least about 10.sup.-4 ohm.sup.-1 cm.sup.-1.

Structure for a PALC display panel having a helium filling doped with

An anode in a channel of a PALC display panel is composed of an electrically conductive core and a protective coating made of a material that is electrically conductive and is non-reactive with hydrogen.

Conductive anode for a PALC display panel using hydrogen-doped helium gas

An anode in a channel of a PALC display panel has an upper surface of a material that is electrically conductive and is non-oxidizing.

A method of fabricating a channel structure for a PALC display panel comprises providing a channel member having channels formed in its upper surface and two electrodes in each channel, masking one electrode in each channel while leaving the other electrode unmasked, depositing material on the unmasked electrode in each channel, and removing the mask from masked electrode in each channel.

Method of fabricating a channel member for a PALC display panel

A PALC display panel has a cathode including a conductive core, a protective coating of a material that is electrically conductive and is non-reactive with hydrogen, and an outer coating of refractory material, and an anode having a surface of a material that is electrically conductive and is non-reactive with hydrogen.

Non-reactive cathode for a PALC display panel using hydrogen-doped

A composite electrode in a channel substrate for a PALC display panel comprises a core that includes a metal and a surface layer of a resistive anodic oxide of the core metal.

Cathode structure for a plasma addressed liquid crystal display panel

Methods and apparatus for fabricating semiconductors by producing a corona discharge plasma comprising an intense beam of high-energy particles, supersonically expanding the plasma, and defining and directing the plasma toward a substrate, are disclosed. A discharge system including a corona discharge nozzle, a source body, a molecular beam skimmer, and a thin-film vacuum deposition chamber is used to deposit or modify a thin film on a substrate. A gas to be activated is supplied to the corona discharge nozzle at a relatively high pressure in comparison to the pressure inside the source body. A corona discharge is generated within an orifice of the nozzle. Energy from the discharge is transferred to the gas particles creating a corona discharge plasma of high-energy particles. As the plasma exits the nozzle orifice, the plasma is supersonically expanded inside the source body. A molecular beam skimmer defines and directs the plasma toward a substrate within a thin-film vacuum deposition chamber.

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Newberg, OR, United States of America

Robert D Hinchliffe