The United States of America As Represented by the United States

University of California

Robert C Sze

Peter B Scott

Irving J Bigio

Gerard P Quigley

A high pressure neon arc lamp and method of using the same for photodynamic therapies is provided. The high pressure neon arc lamp includes a housing that encloses a quantity of neon gas pressurized to about 500 Torr to about 22,000 Torr. At each end of the housing the lamp is connected by electrodes and wires to a pulse generator. The pulse generator generates an initial pulse voltage to breakdown the impedance of the neon gas. Then the pulse generator delivers a current through the neon gas to create an electrical arc that emits light having wavelengths from about 620 nanometers to about 645 nanometers. A method for activating a photosensitizer is provided. Initially, a photosensitizer is administered to a patient and allowed time to be absorbed into target cells. Then the high pressure neon arc lamp is used to illuminate the target cells with red light having wavelengths from about 620 nanometers to about 645 nanometers. The red light activates the photosensitizers to start a chain reaction that may involve oxygen free radicals to destroy the target cells. In this manner, a high pressure neon arc lamp that is inexpensive and efficiently generates red light useful in photodynamic therapy is provided.

High pressure neon arc lamp

Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source. A contamination-free VUV light source having a 225 cm.sup.2 emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm.sup.2 at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing.

Large area, surface discharge pumped, vacuum ultraviolet light source

An inductively stabilized, long pulse duration transverse discharge apparatus. The use of a segmented electrode where each segment is attached to an inductive element permits high energy, high efficiency, long-pulsed laser outputs to be obtained. The present apparatus has been demonstrated with rare-gas halide lasing media. Orders of magnitude increase in pulse repetition frequency are obtained in lasing devices that do not utilize gas flow.

Inductively stabilized, long pulse duration transverse discharge

A cavity formed of Teflon to provide extended static fill lifetimes for gases containing halogens. A double cavity configuration provides structural integrity to the inner Teflon cavity by maintaining an identical multi-atmospheric pressure within the outer structural cavity to minimize tension on the Teflon inner cavity. Use of a quantity of the lasing gas in the outer cavity or a constituent of that gas minimizes contamination of the lasing gas.

Excimer laser with fluoropolymer lining

A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.

XeCl Avalanche discharge laser employing Ar as a diluent

A high energy KrCl laser for producing coherent radiation at 222 nm. Output energies on the order of 100 mJ per pulse are produced utilizing a discharge excitation source to minimize formation of molecular ions, thereby minimizing absorption of laser radiation by the active medium. Additionally, HCl is used as a halogen donor which undergoes a harpooning reaction with metastable Kr.sub.M * to form KrCl.

High energy KrCl electric discharge laser

A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.

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Santa Fe, NM, United States of America

Robert C Sze