International Business Machines Corporation

Robert C Bausmith

Karey L Holland

John Edward Cronin

William J Cote

Carter W Kaanta

Terrance M Wright

Pei-ing P Lee

Allan D Abrams

Steven P Holland

A method for dry etching metals that form low volatility chlordes, in which Z-Cl reaction products are controllably introduced into a conventional Cl-based plasma independent of the workpiece. The Z-Cl products (e.g., AlCl.sub.3, GaCl.sub.3, etc.) are metal chlorides that have both electron acceptor and chloride donor properties. Thus, metals M (e.g., cobalt, copper and nickel) that usually produce low volatility chlorides can be controllably complexed to form high volatility Z.sub.x Cl.sub.y M.sub.z reaction products.

Etching metal films with complexing chloride plasma

A method of selectively tailoring the slope of via hole sidewalls. A first polyimide layer (in which the vias are to be formed) is covered by a strippable layer, and the two layers are isotropically etched. By varying the thickness of the strippable layer with respect to that of the polyimide layer, the slope of the via hole sidewalls can be controlled.

Tailoring of via-hole sidewall slope

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Glastonbury, CT, United States of America

Robert C Bausmith