Applied Materials, Inc.

Robert B Majewski

John P Parks

David P Wanamaker

Christopher F Lane

Shamouil Shamouilian

Michael Santiago Cox

Peter K Loewenhardt

Canfeng Lai

Yeh-Jen Kao

Yen-Kun Victor Wang

Fong M Chang

Yen Kun Wang

A toroidal plasma source ( ) within a substrate processing chamber ( ). The toroidal plasma source forms a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to a surface of the plasma generating structure, thus reducing sputtering erosion of the inner walls. The plasma current is similarly essentially parallel to a process surface ( ) of a substrate ( ) within the chamber. In a further embodiment, a shaped member ( ) between the substrate and the plasma source controls the plasma density in a selected fashion to enhance plasma processing uniformity.

Toroidal plasma source for plasma processing

The invention provides a deposition system and methods of depositing materials onto substrates. In one aspect, a modular processing chamber is provided which includes a chamber body defining a processing region. The chamber body includes a removable gas feedthrough, an electrical feedthrough, a gas distribution assembly mounted on a chamber lid and a microwave applicator for generating reactive gases remote from the processing region.

Apparatus and method for depositing low K dielectric materials

A multi-channel faceplate 200, that in some embodiments is monolithic, is provided as a portion of a gas delivery system to a process chamber 100. At least two sets of gas pathways are disposed through a faceplate and allow for independent delivery of separate gases into a process chamber 100. In one embodiment, a first gas pathway, which includes a first set of vertical channels 226, is formed through the faceplate 200. A second gas pathway includes a second set of vertical channels 228, which is formed through a portion of the faceplate and connected to a set of interconnecting horizontal channels 222 in the faceplate 200, where the second gas pathway maintains fluidic separation from the first gas pathway, prior to the gases entering the process chamber 100.

Dual channel gas distribution plate

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Felton, CA, United States of America

Robert B Majewski