Aviza Technology Limited

Anicon, Inc.

Robert B Herring

Derrick W Foster

Cole Porter

Chris Ratliff

Travis Dodwell

Anindita Chatterji

Ed Nazareno

The present invention relates generally to semiconductor fabrication. More particularly, the present invention relates to system and method of selectively oxidizing one material with respect to another material formed on a semiconductor substrate. A hydrogen-rich oxidation system for performing the process are provided in which innovative safety features are included to avoid the dangers to personnel and equipment that are inherent in working with hydrogen-rich atmospheres.

System and method for hydrogen-rich selective oxidation

A chemical vapor deposition wafer boat for polysilicon deposition in a vertical CVD apparatus comprises upper and lower, mutually engaging, open ended hemicylinders. Gas flow passageways are present in a diffusion zone of the lower hemicylinder wall, but not in the remainder of the walls of the hemicylinder. Gas flow to the wafers is limited to diffusion flow, and the wafers are protected from particulates forming in the gas stream during the coating operation.

Chemical vapor deposition wafer boat

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San Jose, CA, United States of America

Robert B Herring