Cabot Corporation

Global Advanced Metals Usa, Inc.

Robert B Ford

Christopher A Michaluk

Charles E Wickersham, Jr

John P Matera

Eric Von Spreckelsen

A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.

Sputter targets and methods of forming same by rotary axial forging

Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.

Hollow cathode target and methods of making same

A method of producing a valve metal mill form having dimensions sufficient to be divided to form a plurality of sputter targets is described. The method includes multidirectional deformation of an ingot to form a mill form having a preferred average grain size of about 100 microns or less and/or a texture substantially void of textural bands.

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Washington Court House, OH, United States of America

Robert B Ford