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Merck Patent Gmbh

Robert Arent

Hengpeng Wu

Guanyang Lin

The present invention relates to a composition including a sulfonic acid selected from the group consisting of an alkylbenzenesulfonic acid, or its hydrate, a sulfosalicyclic, or its hydrate, and mixtures thereof and the solvent dipropylene glycol dimethyl ether [CAS registry number 111109-77-4] (III).

Photoresist remover compositions

The present invention relates to a composition consisting essentially of a sulfonic acid component selected from the group consisting of camphor sulfonic acid, and a benzene sulfonic acid of structure (I), wherein R is H or a C-1 to C-18 n-alkyl, oxalic acid, a solvent component which consists essentially of an organic solvent component, or a mixture of an organic solvent components and water, wherein the organic solvent component consist of about 100 wt % to about 85 wt % of said solvent component, and further wherein said organic solvent component is either selected from solvent (III), (IV), (V), (VI) (wherein R is selected from the group consisting of &#x2014;(-0-CH&#x2014;CH&#x2014;), &#x2014;OH, &#x2014;OH, and -0-C(&#x2550;O)&#x2014;CH, wherein n' is equal to 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII), (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) or is a mixture, of at least two organic solvents selected from this group. The invention also relates to such compositions also containing a surfactant component, and also pertains to the process of using either of these compositions as a resist remover. Dipropylene glycol monomethyl ether (III), 

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Clinton, NJ, United States of America

Robert Arent