Koninklijke Philips Corporation N.v.

Rob Van Loon

Johannes Cornelis Jans

Niels Methorst

Pascal Wolkotte

An imaging system () comprises a beam source (), a detector unit (), a beam limiting unit (), and a control unit (). The beam source () generates a beam () and projects it onto the detector unit (), thus generating a radiated field () being limited by the beam limiting unit (). The detector unit () provides image data as a result of the beam (). The control unit () is configured to provide image data of a desired region of an object () by selecting a predetermined image field () of the detector unit. The control unit () is configured to determine a correction factor for a relative position and/or a relative orientation of the image field () with respect to the radiated field based on an orientation of the imaging system and to control the beam limiting unit as to reduce the cross-sectional area of the beam.

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Eindhoven, Netherlands

Rob Van Loon