Asml Netherlands B.v.

Rob Jansen

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Harmen Klaas Van Der Schoot

Marcel Beckers

Sebastiaan Maria Johannes Cornelissen

Michel Pieter Dansberg

Robert Johannes Petrus Van Diesen

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Timotheus Franciscus Sengers

Frits Van Der Meulen

Theodorus Petrus Maria Cadee

Tjarko Adriaan Rudolf Van Empel

Wilhelmus Josephus Box

Jan Steven Christiaan Westerlaken

Leon Martin Levasier

Wilhelmus Franciscus Johannes Simons

Frederik Eduard De Jong

Robert-Han Munnig Schmidt

Martinus Agnes Willem Cuijpers

Gerardus Adrianus Antonius Maria Kusters

Marcel Johannus Elisabeth Hubertus Muitjens

Edwin Augustinus Matheus Van Gompel

Martin Frans Pierre Smeets

Nicolas Alban Lallemant

Martijn Van Baren

Nicolaas Antonius Allegondus Johannes Van Asten

Leon Joseph Marie Van Den Schoor

Luberthus Ouwehand

Elke Van Loenhout

David Theodorus Willy Van Der Plas

Stephan Koelink

Wladimir Fransiscus Gerardus Maria Hertog

Erik Vervoort

Maurice Wijckmans

Robert-Han Munnig-Schmidt

A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Apparatus configured to position a workpiece

A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Lithographic apparatus and method for manufacturing a device

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.

Lithographic apparatus

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Veldhoven, Netherlands

Rob Jansen