Mitsui Chemicals, Inc.

Ritsuko Fukuda

Yoshihiro Yamamoto

Toshiro Takao

Keiichi Ikeda

Genji Imai

Isao Hara

A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where Rand Rare each independently hydrogen or methyl and Ris C-Cstraight or branched unsubstituted alkyl or C-Cstraight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.

Positive sensitive resin composition and a process for forming a resist pattern therewith

Copolymer, a manufacturing process therefor and a solution containing thereof

There are herein disclosed a poly&lcub;1-(1-alkoxyalkoxy)-4-(1-methylethenyl)benzene&rcub; having a narrow molecular weight distribution, for example, a poly&lcub;1-(1-alkoxyethoxy)-4-(1-methylethenyl)benzene&rcub; or a poly&lcub;1-(2-tetrahydrofuranyloxy)-4-(1-methylethenyl)benzene&rcub; which is useful as a chemical amplification type positive resist material; a preparation process of the polymer which comprises reacting industrially easily available 4-(1-methylethenyl)phenol with a vinyl ether to produce an alkoxyalkoxy compound, and then carrying out an anionic polymerization; and a preparation process of poly&lcub;4-(1-methylethenyl)phenol&rcub; having a narrow molecular weight distribution useful as a tease polymer for a chemical amplification type positive resist material which comprises reacting the above-mentioned polymer with a protonic acid in the presence of an organic solvent.

Poly&lcub;1-(1-alkoxyalkoxy)-4-(1-methylethenyl)benzene&rcub; having narrow molecular weight distribution, its preparation process, and preparation process of poly&lcub;4-methylethenyl)phenol&rcub; having narrow molecular weight distribution

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Kanagawa, Japan

Ritsuko Fukuda