Hoechst Celanese Corporation

Other

Sumitomo Bakelite Company Limited

International Business Machines Corporation

The B. F. Goodrich Company

Clariant Finance (bvi) Limited

Herberts Gmbh

Hoechst Colanese Corp

Richard Vicari

Saikumar Jayaraman

Larry Funderburk Rhodes

Ralph R Dammel

Olan S Fruchey

Mohammad Aslam

Robert David Allen

Juergen Lingnau

George Kvakovszky

Karl-Friedrich Doessel

Thomas Ingolf Wallow

Kathleen Nelson Juneau

Ratnam Sooriyakumaran

Brian L Goodall

Kenneth G Davenport

Carl David Murphy

Juliann Opitz

Richard Anthony DiPietro

John-Henry Lipian

Wilson B Ray

Dennis R McKean

Ahmed M Tafesh

Robert A Shick

Carlton G Willson

Leah Langsdorf

George M Benedikt

Charles B Hilton

William D Hinsberg, Iii

Mark A Murphy

Brian K Bennett

Debasish Kuila

Douglas J Gordon

Andrew A Sobek

Edwin P Boyd

Pushkara Rao Varanasi

Hiroshi Ito

Michael T Sheehan

James R Sounik

Hans Joachim Metz

Shelby Freland Thames

John R Costanza

Donna L Keene

Joseph A McDonough

Raymond W Rupp

Michael P Bodman

Ronald R Lamonte

Ralph M Miano

Ahamed M Tafesh

James Wayne Rawlins

John R Fritsch

The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.

Polymeric compositions and uses therefor

The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition. Also disclosed are catalyst systems for use in producing the photoresist compositions of the present invention which permit molecular weight control of the photoresist products.

The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

Modified polycyclic polymers

A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula E Ni(C F ) wherein n is 1 or 2 and E represents a neutral electron donor ligand.

Processes for making polymers containing pendant cyclic anhydride groups

Processes of making polymers containing pendant cyclic anhydride groups with nickel-ligand catalyst

Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.

Polycyclic polymers containing pendant cyclic anhydride groups

Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.

Polycyclic resist compositions with increased etch resistance

The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.

Norbornene sulfonamide polymers

Method of preparing norbornene sulfonamide polymers

Novel powder coating compositions containing reactive hyperbranched polymers are disclosed and claimed. Preferred embodiments include powder coating compositions formed from hyperbranched polyesters having terminal hydroxy, carboxy, epoxy, and isocyanate groups. Preferred hyperbranched polyesters are formed from .alpha.,.alpha.-bis-(hydroxymethyl)-propionic acid, which act either as crosslinkers, adhesion promotors, or flow and leveling agents. A process for the synthesis of powder coating compositions is also disclosed which involves (a) self condensation of one or more of the multifunctional monomers to form the hyperbranched polymer, optionally, in the presence of suitable reactive end-capping moieties which are described herein; (b) melt blending of the hyperbranched polymer with suitable amounts of one or more of polyesters, epoxy resins, blocked urethane resins, or acrylic resins, a crosslinker, and one or more of suitable additional ingredients including degassers or flow and leveling agents, to form a flake; and (c) grinding and sieving of the flake to form the powder coating composition. These compositions exhibit improved flow and curing properties. These compositions can therefore be formed into thin films and can be cured at low temperatures to form smooth surfaces. Additionally, these films are hard and exhibit enhanced impact resistance properties than the conventional polyester resins. Thus, these powder coating compositions find utilities in automotive, packaging, and appliances.

Reactive hyperbranched polymers for powder coatings

A polymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.

Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene

The present invention provides novel highly branched macromolecule polymers that have highly controlled molecular architectures, and having the formula: ##STR1## wherein R.sub.4, R.sub.5, and R.sub.6 are defined herein.

Hyperbranched polymers

The present invention provides a novel one-step process for preparing substituted aryls which can be used as end-capping monomers for preparing highly branched macromolecule polymers that have highly controlled molecular architectures. The process comprises the steps of (a) reacting an aromatic acid with an activating carbodiimide for a sufficient period of time and under suitable conditions of temperature and pressure to form an activated aromatic intermediate, and (b) reacting said intermediate with a suitable nucleophile for a sufficient period of time and under suitable conditions of temperature and pressure to form said substituted aryl compound.

Process for preparing substituted aryls

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Corpus Christi, TX, United States of America

Richard Vicari