Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Richard Versluis

Johannes Hubertus Josephina Moors

Dirk Heinrich Ehm

Bastiaan Theodoor Wolschrijn

Stephan Muellender

Norbertus Benedictus Koster

Thomas Stein

Dieter Kraus

Bart Dinand Paarhuis

Marcus Gerhardus Hendrikus Meijerink

Franciscus Johannes Joseph Janssen

Tjarko Adriaan Rudolf Van Empel

Lun Kai Cheng

Marcel Johannus Elisabeth Hubertus Muitjens

Evert Nieuwkoop

Roger Wilhelmus Antonius Henricus Schmitz

Frederik Van Der Graaf

Johannes Fransiscus Maria Velthuis

Axel Sebastiaan Lexmond

Paulus Bartholomeus Johannes Schaareman

Martinus Henricus Johannes Lemmen

Mathilde Gertrudis Maria De Kroon

Willem Arie Van Helden

Charles William Barras Potts

A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.

Method and system for thermally conditioning an optical element

An optical arrangement, e.g. a projection exposure apparatus () for EUV lithography, includes: a housing () enclosing an interior space (); at least one, preferably reflective optical element (--) arranged in the housing (); at least one vacuum generating unit () for the interior space () of the housing (); and at least one vacuum housing (-) arranged in the interior space () and enclosing at least the optical surface () of the optical element (--). A contamination reduction unit is associated with the vacuum housing (-) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface () in relation to the partial pressure of the contaminating substances in the interior space ().

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross -sectional area of the channel section.

Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system

A gas analyzing system is disclosed, the system including a gas analyzer and a reduced pressure chamber in which interior the gas analyzer is arranged, the reduced pressure chamber having an inlet configuration for a gas mixture inflow and an outlet configuration for a gas mixture outflow, wherein the outlet configuration during operation is connected to a pump system to facilitate the gas mixture outflow, the outlet configuration having a channel section and a flow section, the flow section having a cross-sectional area that is smaller than the cross-sectional area of the channel section.

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Delft, Netherlands

Richard Versluis