United Technologies Corporation

Richard S Mullin

Nicholas E Ulion

Igor V Belousov

Oleg G Pankov

Leo A Riendeau

William Patrick Allen

Allan A Noetzel

John W Appleby, Jr

Abdus S Khan

Anatoly Kuzmichev

Maurice L Gell

Neal P Anderson

Yuriy G Kononenko

Richard H Barkalow

Charles Stanley Giggins, Jr

Dmitriy Ryzhikov

Igor V Gulyayev

An apparatus for depositing a coating on one or more parts () has: a chamber (); a part holder () for carrying the part(s); a bias voltage source () coupled to the part(s) to apply a bias voltage to the part(s); a source () of the coating material; a plurality of temperature sensors (); and a plurality of leads () passing outputs of the temperature sensors out from the chamber. A temperature monitoring system () has a temperature data processor (). At least one fiber optic link () couples the temperature data processor to the temperature sensors so as to electrically isolate the temperature data processor from the bias voltage.

Deposition substrate temperature and monitoring

A pressure lock system passes a wire along a wire path from a wire source at a high pressure first region to a destination at a low pressure second region. The pressure lock system includes a pressure lock chamber. A first conduit has an interior positioned to pass the wire along the path and is mounted for rotation. A second conduit has an interior positioned to pass the wire from the pressure lock chamber and is also mounted for rotation. A motor may drive rotation of the first conduit and the second conduit. Pumps may maintain a pressure of the pressure lock chamber lower than a pressure of the first region.

Wire feed pressure lock system

A thermal barrier coating for high temperature applications has improved resistance to heat flow. The coating comprises a large number of these (nanometer scale) layers separated by interfaces which are effective in retarding heat flow. The coating material will typically be oxide based ceramics and the coating has particular applications in gas turbine engines.

Multiple nanolayer coating system

An apparatus for applying ceramic coatings using an electron beam-physical vapor deposition apparatus is described. The apparatus includes means for introducing the anionic constitutent of the ceramic into a coating chamber and means for confining the anionic constituent about the component to be coated during the coating process.

Apparatus for applying ceramic coatings

A method for applying ceramic coatings using electron beam--physical vapor deposition techniques is described. The method includes the step of introducing the anionic constituent of the ceramic into a coating chamber and confining the anionic constituent about the component to be coated during the coating cycle.

EB-PVD method for applying ceramic coatings

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Cromwell, CT, United States of America

Richard S Mullin