Pragmatic Semiconductor Limited

Richard Price

Brian Hardy Cobb

Catherine Ramsdale

Scott Darren White

Neil Davies

Feras Alkhalil

Ken Williamson

Joao De Oliveira

Antony Sou

Anthony Sou

Robert Mann

Pascaline Boulanger

Gillian Ewers

Rob Mann

Peter Fergus Downs

Nathaniel Green

Adrian Thorndyke

A thin-film electronic component includes a first terminal, a second terminal, and a first current path between the first terminal and the second terminal, wherein the first current path is formed from a first segment of a first material and a first segment of a second material arranged in series between the first terminal and the second terminal.

Thin-film components for integrated circuits

A Schottky diode comprises: a first electrode; a second electrode; and a body of semiconductive material connected to the first electrode at a first interface and connected to the second electrode at a second interface, wherein the first interface comprises a first planar region lying in a first plane and the first electrode has a first projection onto the first plane in a first direction normal to the first plane, the second interface comprises a second planar region lying in a second plane and the second electrode has a second projection onto the first plane in said first direction, at least a portion of the second projection lies outside the first projection, said second planar region is offset from the first planar region in said first direction, and one of the first interface and the second interface provides a Schottky contact.

Schottky diode

An electronic circuit comprises a first resistor () and a second resistor (). The first resistor comprises: a first sheet () of resistive material; and a first pair () of conductive contacts, each arranged in electrical contact with the first sheet, and arranged such that a shortest resistive path in the first sheet between the first pair of contacts passes through the first sheet and has a length equal to a thickness (LI) of the first sheet. The second resistor comprises: a second sheet () of resistive material; and a second pair () of conductive contacts, each arranged in electrical contact with the second sheet, and arranged such that a shortest resistive path (L) in the second sheet between the second pair of contacts passes along at least a portion of a length of the second sheet.

Electronic circuits and their methods of manufacture

A method for fabricating a thin-film integrated circuit, IC, including a plurality of electronic components, the method comprising: forming, using a first fabrication technique, the plurality of electronic components, and forming, using a second fabrication technique, a conductive layer on the plurality of electronic components to form a redistribution layer, RDL, wherein the first fabrication technique includes photolithographic patterning, and the first fabrication technique is different to the second fabrication technique.

Method of fabricating a conductive layer on an IC using non-lithographic fabrication techniques

A transistor is disclosed, comprising: a layer of semiconductor material comprising a first portion, a second portion, and a third portion connecting the first portion to the second portion and providing a semiconductive channel between the first portion and the second portion; a conductive first terminal covering and in electrical contact with said first portion of the layer of semiconductor material; a conductive second terminal covering and in electrical contact with said second portion of the layer of semiconductor material; a conductive gate terminal comprising a first overlapping portion covering at least part of the first terminal, and a channel portion covering the third portion of the layer of semiconductor material; and a layer of a first dielectric material, having a first dielectric constant, arranged between the first overlapping portion and the first terminal, and between the channel portion of the gate terminal and the third portion of the layer of semiconductor material. The transistor further comprises a layer of a second dielectric material having a second dielectric constant, the second dielectric constant being lower than the first dielectric constant, the layer of second dielectric material being arranged between at least part of the first overlapping portion and the first terminal, whereby at least part of the first overlapping portion of the gate terminal is separated from the first terminal by the layer of first dielectric material and the layer of second dielectric material.

Transistor and its method of manufacture

A method of manufacturing an electronic circuit (or circuit module) () is disclosed. The electronic circuit comprises a transistor () and a resistor (), the transistor comprising a source terminal (), a drain terminal (), a gate terminal (), and a first body () of material providing a controllable semi-conductive channel between the source and drain terminals, and the resistor comprises a first resistor terminal (), a second resistor terminal (), and a second body () of material providing a resistive current path between the first resistor terminal and the second resistor terminal. The method comprises: forming the first body (); and forming the second body (), wherein the first body comprises a first quantity () of a metal oxide and the second body comprises a second quantity () of said metal oxide. Corresponding electronic circuits are disclosed.

Electronic circuit comprising transistor and resistor

A signal measuring apparatus comprising: signal circuitry configured to receive an input signal to be measured; and memory circuitry coupled to the signal circuitry and configured to store information representing a magnitude of a voltage or a current of the input signal; wherein the memory circuitry comprises a first memory cell having a material which is arranged to switch from a first material state to a second material state in response to a first switching signal being applied thereto, wherein the first memory cell is tuned to a first value for the first switching signal so that a current or voltage with a magnitude at or above the first value will cause the material of the first memory cell to switch from the first material state to second material state; wherein the apparatus is configured to apply a measurement signal indicative of the input signal to the first memory cell for switching the material of the first memory cell from the first material state to the second material state in dependence on a magnitude of the voltage or current of the measurement signal.

Signal measuring apparatus

There is provided a flexible electronic structure for bonding with an external circuit, comprising a flexible substrate, having a first surface, configured for bonding with the external circuit, and an opposing second surface, configured for engagement with a bonding tool, comprising at least one electronic component; at least one contact member, operatively coupled with said at least one electronic component and provided at said first surface of said flexible substrate, and adapted to operably interface with the external circuit after bonding, and at least one shield member, provided at said first surface so as to shieldingly overlap at least a portion of said at least one electronic component, adapted to withstand a predetermined pressure applied to said first surface and/or said opposing second surface during bonding with the external circuit.

Flexible electronic structure

A thin-film integrated circuit comprising a first semiconductor device, a second semiconductor device, a first resistor, and a second resistor is provided. A semiconducting region of the first semiconductor device, a resistor body of the first resistor, a semiconducting region of the second semiconductor device, and a resistor body of the second resistor are formed from at least one of a first source material and a second source material, and a material of the resistor body of the first resistor and a material of the resistor body of the second resistor have different electrical properties.

Resistors for integrated circuits

There is provided a flexible electronic structure for bonding with an external circuit. The flexible electronic structure comprising: a flexible body having a first surface, the flexible body comprising at least one electronic component; at least one contact element configured to bond with the external circuit, the at least one contact element operatively coupled with the at least one electronic component and provided at the first surface of the flexible body, and arranged to operably interface with the external circuit after bonding, and at least one support element provided at the first surface of the flexible body, each support element arranged to contact a corresponding surface element disposed on a first surface of an external structure comprising the external circuit.

Flexible electronic structure including a support element

An interposer subassembly that is suitable for an electronic system having at least one integrated circuit (1C) component. The interposer subassembly includes a flexible base layer, having a first surface and an opposing second surface, at least one active electronic circuit component, operatively integrated within the flexible base layer, and at least one first patterned contact layer, provided on any one of the first surface and the second surface of the flexible base layer and which is configured to operably interface with the at least one active electronic circuit component and the at least one 1C component.

Flexible interposer

A thin-film resistor and a method for fabricating a thin-film resistor are provided. The thin-film resistor comprises a first terminal, a second terminal, and a resistor body providing a resistive current path between the first terminal and the second terminal, and the method comprises depositing a first layer of conductive material onto at least one of the supporting structure and the resistor body, applying a first lithographic mask to the first layer, and etching the first layer to form the first terminal; and depositing a second layer of conductive material onto at least one of the supporting structure and the resistor body, applying a second lithographic mask to the second layer, and etching the second layer to form the second terminal, wherein the first lithographic mask is different to the second lithographic mask, and a lateral separation of the first terminal and the second terminal is less than an in-plane minimum feature size of the first and second lithographic masks

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Sedgefield, United Kingdom

Richard Price