Carl Zeiss Smt Gmbh

Tide Microfluidics B.v.

Richard Petrus Hogervorst

Toralf Gruner

Kerstin Hild

Petrus Theodorus Rutgers

Willem Van Hoeve

Wouter Bernardus Johannes Hakvoort

Mirror elements () include a substrate () and a multilayer arrangement (). The multilayer arrangement includes a reflective layer system () having a radiation entrance surface () and a piezoelectric layer () arranged between the radiation entrance surface and the substrate. Each mirror element includes an electrode arrangement () associated with the piezoelectric layer. A layer thickness (tp) of the piezoelectric layer is controlled by the electric field generated. An interconnection arrangement () electrically interconnects adjacent electrodes of adjacent electrode arrangements. According to one formulation, the interconnection arrangement generates an electric field in a gap region () between the adjacent electrodes. According to another, an electric resistance (Ri) of the interconnection arrangement in the gap region is greater than an electric resistance (Rw) of the adjacent electrodes and less than an electric resistance (Rl) of the piezoelectric layers of adjacent electrode arrangements.

Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement

The present invention is related to a system and method for controlled manufacturing of mono-disperse microbubbles. According to the invention, the mono-disperse nature of the collection of generated microbubbles can be improved by releasing the pressurized gaseous medium used in the system using release valve units. This further allows the system to be embodied as a portable system. In turn, the operator of an ultrasound imaging apparatus may use the system according to the invention to generate microbubbles on a patient-by-patient basis.

System and method for controlled manufacturing of mono-disperse microbubbles

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Enschede, Netherlands

Richard Petrus Hogervorst