Asml Netherlands B.v.

Richard Moerman

Erik Roelof Loopstra

Herman Boom

Michel Riepen

Marco Koert Stavenga

Jeroen Johannes Sophia Maria Mertens

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Patricius Aloysius Jacobus Tinnemans

Johannes Henricus Wilhelmus Jacobs

Martinus Cornelis Maria Verhagen

Franciscus Johannes Joseph Janssen

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Petrus Maria Cadee

Marcel Beckers

Boris Menchtchikov

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Marcel Johannus Elisabeth Hubertus Muitjens

Koen Goorman

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Johannes Catharinus Hubertus Mulkens

Cédric Désiré Grouwstra

Maria Elisabeth Reuhman-Huisken

Bob Streefkerk

Nicolaas Rudolf Kemper

Erik Henricus Egidius Catharina Eummelen

Paulus Martinus Maria Liebregts

Sjoerd Nicolaas Lambertus Donders

Danny Maria Hubertus Philips

Carlo Cornelis Maria Luijten

Aschwin Lodewijk Hendricus Johannes Van Meer

Pieter Mulder

Clemens Johannes Gerardus Van Den Dungen

Evert Van Vliet

Nicolaas Franciscus Koppelaars

Remko Jan Peter Verhees

Aschwin Lodewijk Hendricus Johannes Vermeer

Sergei Shulepov

Koen Steffens

Jan Willem Cromwijk

Martinus Hendrickus Antonius Leenders

Ronald Van Der Ham

Marinus Jochemsen

Marco Baragona

David Bessems

Youri Johannes Laurentius Maria Van Dommelen

Fabrizio Evangelista

Gert-Jan Gerardus Johannes Thomas Brands

Jacob Marinus Jan Den Toonder

Pieter Lein Joseph Gunter

Dirk De Vries

Hua Li

Erik Witberg

Ralph Joseph Meijers

Robertus Leonardus Maria In 't Groen

Johanna Antoinette Maria Sondag-Huethorst

Milica Kovacevic-Milivojevic

Michel Franciscus Johannes Van Rooy

Mana Elisabeth Reuhman-Huisken

Ralph Theodorus Hubertus Maessen

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Jacobus Johannus Leonardus Hendricus Verspaij

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

Lithographic apparatus and device manufacturing method

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.

A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.

Immersion lithography

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Lithographic apparatus and device manufacturing method having liquid evaporation control

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Son, Netherlands

Richard Moerman