Keysight Technologies, Inc.

Aixtron Se

Richard Keith Karlquist

Stephen E Savas

Robert Eugene Weisse

Described herein are techniques for supplying radio frequency (RF) power to a large area plasma source so as to produce a plasma that is substantially uniform in two spatial dimensions. The RF power may be supplied by a power supply system, which may comprise a RF source and a distribution network. The distribution network may comprise a matching network, and a branching circuit that divides the RF power into several branches. Each of the branches of the distribution network may include a phase shifter that shifts the RF signal (which carries the RF power) by an odd multiple of 90&#xb0;, and a blocking filter which blocks any harmonics and other unwanted frequencies which are reflected from a plasma source. The output of the branches may be coupled to feed points that are spatially distributed over the one or more electrodes of the plasma source.

System and method for distributing RF power to a plasma source

An apparatus comprises: a first oscillator; a second oscillator; a first frequency synthesizer configured to receive a first input from the first oscillator and to provide a scaled first output frequency based on the first input; a second frequency synthesizer configured to receive a second input from the second oscillator and to provide a scaled second output frequency based on the second input; a mixer configured to receive the scaled first output frequency and the scaled second output frequency and to output a difference between the scaled first output frequency and the scaled second output frequency; and a processor configured to determine a change in an output frequency of the first oscillator based on the difference. The change in the output frequency provides an indication of a change in a measurement parameter.

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Galt, CA, United States of America

Richard Keith Karlquist