Rca Inc.

Richard Joseph Himics

Eugene Samuel Poliniak

Nitin V Desai

Daniel Louis Ross

Michael Kaplan

Scott Oliver Graham

Henry Wielicki

Howard G Scheible

Thomas Francis Rosenkranz

Homopolymers of 1-aza-5-acryloxymethyl-3,7-dioxabicyclo[3.3.0]octane are useful as resists for recording information patterns having high sensitivity and excellent contrast between exposed and unexposed areas.

Method of exposing and developing a homopolymer resist

Homopolymers of 1-aza-5-acryloxymethyl-3,7-dioxa-bicyclo[3.3.0]octane are useful as resists for recording information patterns having high sensitivity and excellent contrast between exposed and unexposed areas.

Novel resists and recording media

A method of purifying methyl alkyl siloxane lubricants of the formula ##STR1## wherein R is an alkyl group of 4-20 carbon atoms and x is an integer which comprises multiply extracting with acetone.

Method for purifying methyl alkyl siloxane lubricants

This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.

Photoresist containing a thiodipropionate compound

Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.

Photosensitive copolymer on silicon support

This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.

Method of transferring a surface relief pattern from a poly(olefin

To improve the adherence of an olefin-SO.sub.2 copolymer film employed as an electron beam resist to a metallic substrate, a thin film of gold is first applied to the substrate. The resulting bond is strong enough to withstand exposure to electron beams, development of the resist film and electroplating of the film witout undercutting, lifting or distortion of the film.

Olefin-SO.sub.2 copolymer film adhesion to a substrate

Method of preparing a pattern on a silicon wafer

Three developer solvents 2-methylcyclohexanone, 3-methylcyclohexanone, and a mixture of acetonyl acetate and acetone, improve the resolution of electron beam exposed films of poly(1-methyl-1-cyclopentene-SO.sub.2) copolymers.

Development of poly(1-methyl-1-cyclopentene-SO.sub.2) electron beam

In preparing an electron beam resist film of a copolymer of an olefin and SO.sub.2, the steps of removing insoluble particles, drying the films under high vacuum and storing them in a moisture-free atmosphere are required to prevent cracking of the films during development.

Growing community of inventors

Skillman, NJ, United States of America

Richard Joseph Himics